LEADER 01487nam  2200457   450 
001 9910713497103321
005 20200415103653.0
035   $a(CKB)5470000002500678
035   $a(OCoLC)1150884848
035   $a(EXLCZ)995470000002500678
100   $a20200415j202003    ua             0
101 0 $aeng
135   $aur|||||||||||
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 10$aMicrowave photoelasticity $ea resonant wavelength approach applied to PEEK polymer /$fPeter J. Schemmel and Seth W. Waldstein
210  1$aCleveland, Ohio :$cNational Aeronautics and Space Administration, Glenn Research Center,$dMarch 2020.
215   $a1 online resource (12 pages) $ccolor illustrations
225 1 $aNASA/TM ;$v2020-220499
300   $a"March 2020."
320   $aIncludes bibliographical references (pages 11-12).
517   $aMicrowave photoelasticity 
606   $aPolymers$2nasat
606   $aPEEK$2nasat
606   $aNondestructive tests$2nasat
606   $aPhotoelasticity$2nasat
606   $aMaterials tests$2nasat
615  7$aPolymers.
615  7$aPEEK.
615  7$aNondestructive tests.
615  7$aPhotoelasticity.
615  7$aMaterials tests.
700   $aSchemmel$b Peter J.$01401168
712 02$aNASA Glenn Research Center,
801  0$bGPO
801  1$bGPO
906   $aBOOK
912   $a9910713497103321
996   $aMicrowave photoelasticity$93469508
997   $aUNINA