LEADER 01456aam  2200397I  450 
001 9910711191003321
005 20151030113009.0
024 8 $aGOVPUB-C13-8c4c29a3b18166d326b052eec1974771
035   $a(CKB)5470000002480097
035   $a(OCoLC)927169870
035   $a(EXLCZ)995470000002480097
100   $a20151030d2001      ua             0
101 0 $aeng
181   $2rdacontent
182   $2rdamedia
183   $2rdacarrier
200 10$aWorkshop on mass flow measurement and control for the semiconductor industry /$fRobert F. Berg, David S. Green, George E. Mattingly
210  1$aGaithersburg, MD :$cU.S. Dept. of Commerce, National Institute of Standards and Technology,$d2001.
215   $a1 online resource
225 1 $aNIST special publication ;$v400-101
300   $a2001.
300   $aContributed record: Metadata reviewed, not verified. Some fields updated by batch processes.
300   $aTitle from PDF title page.
320   $aIncludes bibliographical references.
700   $aBerg$b Robert F$01394986
701   $aBerg$b Robert F$01394986
701   $aGreen$b David S$0151082
701   $aMattingly$b G. E$01390867
712 02$aNational Institute of Standards and Technology (U.S.)
801  0$bNBS
801  1$bNBS
801  2$bGPO
906   $aBOOK
912   $a9910711191003321
996   $aWorkshop on mass flow measurement and control for the semiconductor industry$93452853
997   $aUNINA