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005 20151030113005.0
024 8 $aGOVPUB-C13-214b9bc18cda152b19842a3588c5daf4
035   $a(CKB)5470000002479946
035   $a(OCoLC)927169521
035   $a(EXLCZ)995470000002479946
100   $a20151030d1979      ua             0
101 0 $aeng
181   $2rdacontent
182   $2rdamedia
183   $2rdacarrier
200 10$aSpreading resistance analysis for silicon layers with nonuniform resistivity /$fDavid H. Dickey, James R. Ehrstein
210  1$aGaithersburg, MD :$cU.S. Dept. of Commerce, National Institute of Standards and Technology,$d1979.
215   $a1 online resource
225 1 $aNBS special publication ;$v400-48
300   $a1979.
300   $aContributed record: Metadata reviewed, not verified. Some fields updated by batch processes.
300   $aTitle from PDF title page.
320   $aIncludes bibliographical references.
700   $aDickey$b David H$0253654
701   $aDickey$b David H$0253654
701   $aEhrstein$b James R$01392930
712 02$aUnited States.$bNational Bureau of Standards.
801  0$bNBS
801  1$bNBS
801  2$bGPO
906   $aBOOK
912   $a9910709506003321
996   $aSpreading resistance analysis for silicon layers with nonuniform resistivity$93475748
997   $aUNINA