LEADER 01911oam  2200457I  450 
001 9910708603403321
005 20180516150938.0
035   $a(CKB)5470000002471197
035   $a(OCoLC)1035764197
035   $a(OCoLC)995470000002471197
035   $a(EXLCZ)995470000002471197
100   $a20180516d1990      ua             0
101 0 $aeng
135   $aur|||||||||||
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 12$aA numerical and experimental analysis of reactor performance and deposition rates for CVD on monofilaments /$fS.A. Gokoglu [and four others]
210  1$a[Washington, D.C.] :$cNational Aeronautics and Space Administration,$d[1990?]
215   $a1 online resource (7 pages) $cillustrations
225 1 $aNASA/TM ;$v103631
300   $a"Prepared for the 11th International Conference on Chemical Vapor Deposition (CVD-XI) sponsored by the Electrochemical Society Seattle, Washington, October 14-19, 1990."
320   $aIncludes bibliographical references (pages 4-5).
517 3 $aNumerical and experimental analysis of reactor performance and deposition rates for chemical vapor deposition on monofilaments
606   $aNumerical analysis$2nasat
606   $aChemical reactors$2nasat
606   $aComputational fluid dynamics$2nasat
606   $aAxisymmetric flow$2nasat
615  7$aNumerical analysis.
615  7$aChemical reactors.
615  7$aComputational fluid dynamics.
615  7$aAxisymmetric flow.
700   $aGokoglu$b Suleyman A$g(Suleyman Akif),$01392913
712 02$aUnited States.$bNational Aeronautics and Space Administration,
801  0$bGPO
801  1$bGPO
801  2$bGPO
906   $aBOOK
912   $a9910708603403321
996   $aA numerical and experimental analysis of reactor performance and deposition rates for CVD on monofilaments$93498212
997   $aUNINA