LEADER 01021nam0-22002891i-450- 001 990006093060403321 005 19980601 035 $a000609306 035 $aFED01000609306 035 $a(Aleph)000609306FED01 035 $a000609306 100 $a19980601g19501961km-y0itay50------ba 105 $a--------00-yy 200 1 $aACTA martyrum. 210 $aLouvain$cSecretariat du Corpusco$d1950-1961 215 $a4 v.$d25 cm 225 1 $aCorpus scriptorum Christianorum Orientalium$iScriptores Coptici$v3 327 $a1.: Ediderunt I. Balestri et H. Hyvernat. 2.: Interpretati sunt I, Balestri et H. Hyvernat. 3.: Ediderunt I. Balestri et H. Hyvernat 4.: Interpretatus est H. Hyvernat.$aRistampa ananstatica da: Parisiis, Lipsiae, Typ. reipublicae-Harrassowitz, 1907-1924) 676 $a340.5 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990006093060403321 952 $aIV Z OR 6 (3,4,6)$b14229$fFGBC 959 $aFGBC 996 $aActa martyrum$956007 997 $aUNINA DB $aGIU01 LEADER 01276nam 2200397 450 001 9910707714803321 005 20161121134751.0 035 $a(CKB)5470000002467404 035 $a(OCoLC)963856832 035 $a(EXLCZ)995470000002467404 100 $a20161121d2016 ua 0 101 0 $aeng 135 $aurmn||||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aCharacterization of magnetron sputtered copper-nickel thin films and alloys /$fby Eugene Zakar [and five others] 210 1$aAdelphi, MD :$cUS Army Research Laboratory,$d2016. 215 $a1 online resource (iv, 12 pages) $ccolor illustrations 225 1 $aARL-TR ;$v7783 300 $a"Sep 2016." 320 $aIncludes bibliographical references (page 10). 606 $aMagnetron sputtering 606 $aThin films 606 $aMetallic films 615 0$aMagnetron sputtering. 615 0$aThin films. 615 0$aMetallic films. 700 $aZakar$b Eugene$01387268 712 02$aU.S. Army Research Laboratory, 801 0$bGPO 801 1$bGPO 906 $aBOOK 912 $a9910707714803321 996 $aCharacterization of magnetron sputtered copper-nickel thin films and alloys$93542628 997 $aUNINA