LEADER 01320oam 2200385 450 001 9910701449303321 005 20170906141900.0 035 $a(CKB)5470000002418585 035 $a(OCoLC)1003045489 035 $a(EXLCZ)995470000002418585 100 $a20170906j201009 ua 0 101 0 $aeng 135 $aur||||||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aFabrication of 3D silicon-based photonic crystal structure with "single" self aligned etching process /$fGerard Dang, Monica Taysing-Lara, and Weimin Zhou 210 1$aAdelphi, MD :$cArmy Research Laboratory,$dSeptember 2010. 215 $a1 online resource (iv, 8 pages) $ccolor illustrations 225 1 $aARL-TN ;$v0407 606 $aPhotonic crystals 606 $aNanostructured materials 615 0$aPhotonic crystals. 615 0$aNanostructured materials. 700 $aDang$b Gerard$01411781 702 $aTaysing-Lara$b Monica 702 $aZhou$b Weimin$c(Physicist), 712 02$aU.S. Army Research Laboratory, 801 0$bGPO 801 1$bGPO 801 2$bGPO 906 $aBOOK 912 $a9910701449303321 996 $aFabrication of 3D silicon-based photonic crystal structure with "single" self aligned etching process$93503746 997 $aUNINA