LEADER 01563oam 2200433Ia 450 001 9910699339303321 005 20230902162202.0 035 $a(CKB)5470000002402524 035 $a(OCoLC)227908497 035 $a(EXLCZ)995470000002402524 100 $a20080513d2006 ua 0 101 0 $aeng 135 $aurmn||||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aPulsed capacitance measurement of silicon carbide (SiC) Schottky diode and SiC metal oxide semiconductor$b[electronic resource] /$fby Timothy E. Griffin 210 1$aAdelphi, MD :$cArmy Research Laboratory,$d[2006] 215 $a1 online resource (vi, 22 pages) $cillustrations 225 1 $aARL-TR ;$v3993 300 $aTitle from PDF title screen (ARL, viewed Mar. 23, 2010). 300 $a"November 2006." 410 0$aARL-TR (Aberdeen Proving Ground, Md.) ;$v3993. 517 $aPulsed capacitance measurement of silicon carbide 606 $aPulsed power systems 606 $aDiodes, Schottky-barrier 606 $aMetal oxide semiconductors 615 0$aPulsed power systems. 615 0$aDiodes, Schottky-barrier. 615 0$aMetal oxide semiconductors. 700 $aGriffin$b Timothy E$01391748 712 02$aU.S. Army Research Laboratory. 801 0$bDTICE 801 1$bDTICE 801 2$bGPO 906 $aBOOK 912 $a9910699339303321 996 $aPulsed capacitance measurement of silicon carbide (SiC) Schottky diode and SiC metal oxide semiconductor$93471624 997 $aUNINA