LEADER 01804oam  2200445Ia 450 
001 9910698903703321
005 20091119133112.0
035   $a(CKB)5470000002398844
035   $a(OCoLC)422780585
035   $a(EXLCZ)995470000002398844
100   $a20090707d2009      ua             0
101 0 $aeng
135   $aurmn|||||||||
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 00$aEpitaxial thin film silicon solar cells fabricated by hot wire chemical vapor deposition below 750°C$b[electronic resource] $epreprint /$fK. Alberi ... [and others]
210  1$aGolden, CO :$cNational Renewable Energy Laboratory,$d2009.
215   $a1 online resource (3 pages)
225 1 $aConference paper ;$vNREL/CP-520-45965
300   $aTitle from title screen (viewed July 7, 2009).
300   $a"June 2009."
300   $a"To be presented at the 34th IEEE Photovoltaic Specialists Conference, Philadelphia, Pennsylvania, June 7-12, 2009."
320   $aIncludes bibliographical references (page 3).
517   $aEpitaxial thin film silicon solar cells fabricated by hot wire chemical vapor deposition below 750°C 
606   $aPhotovoltaic cells$xResearch
606   $aSolar cells$xDesign and construction
606   $aChemical vapor deposition
615  0$aPhotovoltaic cells$xResearch.
615  0$aSolar cells$xDesign and construction.
615  0$aChemical vapor deposition.
701   $aAlberi$b K$g(Kirstin)$01398817
712 02$aNational Renewable Energy Laboratory (U.S.)
801  0$bSOE
801  1$bSOE
801  2$bGPO
906   $aBOOK
912   $a9910698903703321
996   $aEpitaxial thin film silicon solar cells fabricated by hot wire chemical vapor deposition below 750°C$93548656
997   $aUNINA