LEADER 01640oam 2200385Ka 450 001 9910696154603321 005 20070921162104.0 035 $a(CKB)5470000002375265 035 $a(OCoLC)173025349 035 $a(EXLCZ)995470000002375265 100 $a20070918d2006 ua 0 101 0 $aeng 135 $aurmn||||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 00$aOn the effect of the film hydrogen content and deposition type on the grain nucleation and grain growth during crystallization of a-Si:H films$b[electronic resource] $epreprint /$fA.H. Mahan ... [and others] 210 1$aGolden, CO :$cNational Renewable Energy Laboratory,$d[2006] 215 $a4 pages $cdigital, PDF file 225 1 $aNREL/CP ;$v520-39901 300 $aTitle from title screen (viewed Sept. 21, 2007). 300 $a"Presented at the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4), Waikoloa, Hawaii, May 7-12, 2006." 300 $a"May 2006." 517 $aOn the effect of the film hydrogen content and deposition type on the grain nucleation and grain growth during crystallization of a-Si 606 $aThin films$xResearch 615 0$aThin films$xResearch. 701 $aMahan$b A. Harv$01385028 712 02$aNational Renewable Energy Laboratory (U.S.) 801 0$bSOE 801 1$bSOE 801 2$bGPO 906 $aBOOK 912 $a9910696154603321 996 $aOn the effect of the film hydrogen content and deposition type on the grain nucleation and grain growth during crystallization of a-Si:H films$93450112 997 $aUNINA