LEADER 03996nam 22007575 450 001 9910629294203321 005 20260605213053.0 010 $a9789811968723$b(electronic bk.) 024 7 $a10.1007/978-981-19-6872-3 035 $a(MiAaPQ)EBC7133281 035 $a(Au-PeEL)EBL7133281 035 $a(CKB)25299342900041 035 $a(PPN)266350585 035 $a(DE-He213)978-981-19-6872-3 035 $a(OCoLC)1350552367 035 $a(EXLCZ)9925299342900041 100 $a20221107d2022 u| 0 101 0 $aeng 135 $aurcnu|||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aStructure and Electronic Properties of Ultrathin In Films on Si(111) /$fby Shigemi Terakawa 205 $a1st ed. 2022. 210 1$aSingapore :$cSpringer Nature Singapore :$cImprint: Springer,$d2022. 215 $a1 online resource (83 pages) 225 1 $aSpringer Theses, Recognizing Outstanding Ph.D. Research,$x2190-5061 311 08$aPrint version: Terakawa, Shigemi Structure and Electronic Properties of Ultrathin in Films on Si(111) Singapore : Springer,c2022 9789811968716 320 $aIncludes bibliographical references. 327 $a1. Introduction -- 2. Experimental methods -- 3. Structure and electronic properties of In single-layer metal on Si(111) -- 4. Structure and electronic properties of ultrathin (In, Mg) films on Si(111) -- 5. Summary. 330 $aThis book reports the establishment of a single-atomic layer metal of In and a novel (In, Mg) ultrathin film on Si(111) surfaces. A double-layer phase of In called ?rect? has been extensively investigated as a two-dimensional metal. Another crystalline phase called ?hex? was also suggested, but it had not been established due to difficulty in preparing the sample. The author succeeded in growing the large and high-quality sample of the hex phase and revealed that it is a single-layer metal. The author also established a new triple-atomic layer (In, Mg) film with a nearly freestanding character by Mg deposition onto the In double layer. This work proposes a novel method to decouple ultrathin metal films from Si dangling bonds. The present study demonstrates interesting properties of indium itself, which is a p-block metal both with metallicity and covalency. In this book, readers also see principles of various surface analysis techniques and learn how to use them and analyze the results in the real systems. This book is useful to researchers and students interested in surface science, particularly ultrathin metal films on semiconductor surfaces. 410 0$aSpringer Theses, Recognizing Outstanding Ph.D. Research,$x2190-5061 606 $aSurfaces (Technology) 606 $aThin films 606 $aSurfaces (Physics) 606 $aMetals 606 $aMaterials$xAnalysis 606 $aChemistry, Inorganic 606 $aDensity functionals 606 $aSurfaces, Interfaces and Thin Film 606 $aSurface and Interface and Thin Film 606 $aMetals and Alloys 606 $aCharacterization and Analytical Technique 606 $aInorganic Chemistry 606 $aDensity Functional Theory 615 0$aSurfaces (Technology) 615 0$aThin films. 615 0$aSurfaces (Physics) 615 0$aMetals. 615 0$aMaterials$xAnalysis. 615 0$aChemistry, Inorganic. 615 0$aDensity functionals. 615 14$aSurfaces, Interfaces and Thin Film. 615 24$aSurface and Interface and Thin Film. 615 24$aMetals and Alloys. 615 24$aCharacterization and Analytical Technique. 615 24$aInorganic Chemistry. 615 24$aDensity Functional Theory. 676 $a621.38171 700 $aTerakawa$b Shigemi$01265780 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 912 $a9910629294203321 996 $aStructure and Electronic Properties of Ultrathin in Films on Si(111)$92968231 997 $aUNINA LEADER 01341nas 2200433-a 450 001 9910805701403321 005 20260625103056.0 011 $a1050-828X 035 $a(CKB)991042749662350 035 $a(CONSER)sn-91000703- 035 $a(EXLCZ)99991042749662350 100 $a19910530a19919999 --- a 101 0 $aeng 181 $ctxt$2rdacontent 181 $csti$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 14$aThe Journal of light construction 205 $a[National ed.]. 210 $aWashington, DC $cBuilderburg Partnership$dc1991- 215 $a1 online resource 300 $aTitle from cover. 300 $aPublished: Washington, DC : Hanley Wood, LLC, <2002-> 311 08$aPrint version: Journal of light construction (National ed.) 1056-828X (DLC)sn 91000703 (OCoLC)23859442 517 1 $aJLC 531 $aJOURNAL OF LIGHT CONSTRUCTION 531 0 $aJ. light constr. 606 $aBuilding$zUnited States$vPeriodicals 606 $aBuilding$2fast$3(OCoLC)fst00840551 607 $aUnited States$2fast 608 $aPeriodicals.$2fast 608 $aPeriodicals.$2lcgft 615 0$aBuilding 615 7$aBuilding. 676 $a690 906 $aJOURNAL 912 $a9910805701403321 996 $aThe Journal of light construction$92306257 997 $aUNINA