LEADER 01184nam0-22003971i-450- 001 990005481490203316 005 20010829120000.0 035 $a000548149 035 $aUSA01000548149 035 $a(ALEPH)000548149USA01 035 $a000548149 100 $a20010829d1993-------|0enac50------ba 101 $aeng 102 $aGB 105 $a|||| ||||| 200 1 $aApplied non-parametric statistical methods$fP. Sprent 205 $a2nd ed 210 $dLondon : Chapman & Hall,1993 215 $aX, 343 p.$cill.$d24 cm. 606 $aStatistica nonparametrica$2FI 620 $dLondon 676 $a519.5$cStatistica matematica$v21 700 1$aSPRENT,$bPeter$0102087 712 $aChapman and Hall 801 $aIT$bSOL$c20120104 912 $a990005481490203316 950 $aDIP.TO SCIENZE ECONOMICHE - (SA)$dDS 500 519.5 SPR$e8097 DISES 951 $aDIP.TO SCIENZE ECONOMICHE - (SA)$bDS1999 1E 19990302 951 $a500 519.5 SPR$b8097 DISES 959 $aBK 969 $aDISES 979 $c20121027$lUSA01$h1532 979 $c20121027$lUSA01$h1613 996 $aApplied non-parametric statistical methods$91128730 997 $aUNISA NUM $aUSA8585 LEADER 04034nam 2200805z- 450 001 9910595071103321 005 20220916 035 $a(CKB)5680000000080819 035 $a(oapen)https://directory.doabooks.org/handle/20.500.12854/92129 035 $a(oapen)doab92129 035 $a(EXLCZ)995680000000080819 100 $a20202209d2022 |y 0 101 0 $aeng 135 $aurmn|---annan 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 00$aAdvances in Plasma Diagnostics and Applications 210 $aBasel$d2022 215 $a1 online resource (124 p.) 311 08$a3-0365-4319-8 311 08$a3-0365-4320-1 330 $aPlasma can be generated via the combination of energy-inducing fragmentation, ionization, and excitation of molecular. Such processes occur throughout the life of the plasma, resulting in a wide variety of atomic and molecular species, which can be electrically charged, energetically excited, highly reactive, or any combination of these states. Plasma diagnostics can demonstrate important discharge characteristics and the mechanisms of plasma-induced processes. Parameter's dynamic range spans many orders of magnitude, and spatial/temporal scales significantly vary during plasma source configurations. Many diagnostic techniques have been developed to characterize plasma, including scattering techniques, intensified charge-coupled device cameras, laser-based methods, optical emission spectroscopy, mass spectrometry, electron paramagnetic resonance spectroscopy, gas chromatography, etc. Although various mature diagnostic technologies for plasma discharges have been developed, there are still many challenges. The measurement precision is not only affected by the diagnostic equipment/ techniques, but also by the plasma discharge itself. In many applications, direct measurements of the parameters of interest are still not possible. In addition, the plasma environments in application processes are unusually complex, and their reactions are still not fully understood. Plasma can exist in a variety of forms due to discharge modes resulting from different means of creation, resulting in a wide range of applications. This brings together many research fields, including physics, engineering, chemistry, biology, and medicine. 606 $aHistory of engineering & technology$2bicssc 606 $aTechnology: general issues$2bicssc 610 $aasymmetric 610 $abiomedical applications 610 $acarbon nanoparticle 610 $acoagulation 610 $acold atmospheric plasma 610 $adischarge characteristics 610 $adynamic pressure measurement 610 $aFe-based amorphous alloy 610 $agermination 610 $agliding arc plasma 610 $agrowth enhancement 610 $aMg deposition 610 $amicrostructure and properties 610 $an/a 610 $anon-thermal plasma 610 $anozzle 610 $aoblique detonation 610 $aoptical emission spectroscopy 610 $aplasma agriculture 610 $aplasma chemical vapor deposition 610 $aplasma spray welding 610 $aplasma treatment 610 $areflection 610 $aschlieren images 610 $aseed germination 610 $ashock wave control 610 $aSparkJet actuator 610 $astatic instability control 610 $asupersonic flow 610 $asurface modification 610 $aswirl flame 610 $atiny plasma jet 610 $aWC-Co coating 615 7$aHistory of engineering & technology 615 7$aTechnology: general issues 700 $aChen$b Zhitong$4edt$01277778 702 $aAttri$b Pankaj$4edt 702 $aWang$b Qiu$4edt 702 $aChen$b Zhitong$4oth 702 $aAttri$b Pankaj$4oth 702 $aWang$b Qiu$4oth 906 $aBOOK 912 $a9910595071103321 996 $aAdvances in Plasma Diagnostics and Applications$93012039 997 $aUNINA