LEADER 03633nam  2200973z- 450 
001 9910566457303321
005 20220506
035   $a(CKB)5680000000037808
035   $a(oapen)https://directory.doabooks.org/handle/20.500.12854/81057
035   $a(oapen)doab81057
035   $a(EXLCZ)995680000000037808
100   $a20202205d2022      |y         0
101 0 $aeng
135   $aurmn|---annan
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 00$aMetal Oxide Thin Films: Synthesis, Characterization and Applications
210   $aBasel$cMDPI - Multidisciplinary Digital Publishing Institute$d2022
215   $a1 online resource (144 p.)
311 08$a3-0365-1056-7 
311 08$a3-0365-1057-5 
330   $aThis Special Issue will compile recent developments in the field of metal oxide thin film deposition.  The articles presented in this Special Issue will cover various topics, ranging from, but not limited to, the optimization of deposition methods, thin film preparations, the functionalization of surfaces with targeted applications, nanosensors, catalysis, electronic devices, biocidal coating, and the synthesis of nanostructures via the accurate control of thin film deposition methods, among others. Topics are open to metal oxide thin film deposition and characterization for the development of applications.
517   $aMetal Oxide Thin Films
606   $aHistory of engineering and technology$2bicssc
606   $aMaterials science$2bicssc
606   $aTechnology: general issues$2bicssc
610   $aALD
610   $aaluminum
610   $aaluminum-zinc oxide
610   $aanodizing
610   $aatmospheric pressure chemical vapour deposition transport properties
610   $aatomic layer deposition
610   $abismuth ferrite
610   $acarrier gas
610   $acellulose
610   $acharge carrier mobility
610   $acrystallography
610   $adevice performance
610   $adynamic hot-probe measurements
610   $aelectrical characteristic
610   $aepitaxy
610   $agadolinium cobaltites
610   $ahigh-aspect-ratio substrate
610   $aIGZO TFTs
610   $aimpedance spectroscopy
610   $aindium-tin oxide
610   $aions adsorption
610   $aLa-doping
610   $alow-temperature fabrication
610   $amagnetoresistance
610   $amagnetron co-sputtering
610   $aMAO (micro-arc oxidation) coating
610   $ametal oxide thin films
610   $amist chemical vapor deposition (mist-CVD)
610   $an/a
610   $aNiTiO3
610   $aoxidation
610   $aozone
610   $apiezoelectricity
610   $aplasma electrolytic oxidation
610   $apreferential crystal growth orientation
610   $aself-lubricating
610   $aSEM
610   $asol-gel
610   $astability
610   $athin films
610   $atin oxide
610   $atransparent semiconductor
610   $atribological performance
610   $awide-bandgap semiconductor
610   $a?-Ga2O3
610   $a?-diketonates
615  7$aHistory of engineering and technology
615  7$aMaterials science
615  7$aTechnology: general issues
700   $aRauwel$b habil. Erwan$4edt$01296341
702   $aRauwel$b Protima$4edt
702   $aRauwel$b habil. Erwan$4oth
702   $aRauwel$b Protima$4oth
906   $aBOOK
912   $a9910566457303321
996   $aMetal Oxide Thin Films: Synthesis, Characterization and Applications$93037200
997   $aUNINA