LEADER 02885nam  2200349z- 450 
001 9910557586603321
005 20231214133544.0
035   $a(CKB)5400000000043782
035   $a(oapen)https://directory.doabooks.org/handle/20.500.12854/68793
035   $a(EXLCZ)995400000000043782
100   $a20202105d2020      |y             0
101 0 $aeng
135   $aurmn|---annan
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 10$aAdvanced Strategies in Thin Film Engineering by Magnetron Sputtering
210   $aBasel, Switzerland$cMDPI - Multidisciplinary Digital Publishing Institute$d2020
215   $a1 electronic resource (148 p.)
311   $a3-03936-429-4 
311   $a3-03936-430-8 
330   $aRecent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: ? Nanostructure-related properties; ? Atomistic processes during film growth; ? Process control, process stability, and in situ diagnostics; ? Fundamentals and applications of HiPIMS; ? Thin film nanostructuration phenomena; ? Tribological, anticorrosion, and mechanical properties; ? Combined procedures based on the magnetron sputtering technique; ? Industrial applications; ? Devices.
606   $aResearch & information: general$2bicssc
615  7$aResearch & information: general
700   $aPalmero$b Alberto$4edt$01304458
702   $aMartin$b Nicolas$4edt
702   $aPalmero$b Alberto$4oth
702   $aMartin$b Nicolas$4oth
906   $aBOOK
912   $a9910557586603321
996   $aAdvanced Strategies in Thin Film Engineering by Magnetron Sputtering$93027438
997   $aUNINA