LEADER 04455nam 2200877z- 450 001 9910557487403321 005 20231214133212.0 035 $a(CKB)5400000000042958 035 $a(oapen)https://directory.doabooks.org/handle/20.500.12854/77002 035 $a(EXLCZ)995400000000042958 100 $a20202201d2021 |y 0 101 0 $aeng 135 $aurmn|---annan 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aNanoscale Self-Assembly: Nanopatterning and Metrology 210 $aBasel, Switzerland$cMDPI - Multidisciplinary Digital Publishing Institute$d2021 215 $a1 electronic resource (124 p.) 311 $a3-0365-1961-0 311 $a3-0365-1960-2 330 $aThe self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epitaxial growths, in which atoms represent the building blocks. In lithography, the use of self-assembling materials is considered an extremely promising patterning option to overcome the size scale limitations imposed by the conventional photolithographic methods. To this purpose, in the last two decades several supramolecular self-assembling materials have been investigated and successfully applied to create patterns at a nanometric scale. Although considerable progress has been made so far in the control of self-assembly processes applied to nanolithography, a number of unresolved problems related to the reproducibility and metrology of the self-assembled features are still open. Addressing these issues is mandatory in order to allow the widespread diffusion of SA materials for applications such as microelectronics, photonics, or biology. In this context, the aim of the present Special Issue is to gather original research papers and comprehensive reviews covering various aspects of the self-assembly processes applied to nanopatterning. Topics include the development of novel SA methods, the realization of nanometric structures and devices, and the improvement of their long-range order. Moreover, metrology issues related to the nanoscale characterization of self-assembled structures are addressed. 517 $aNanoscale Self-Assembly 606 $aTechnology: general issues$2bicssc 610 $ablock copolymer self-assembly 610 $aanalytical ultracentrifugation 610 $atannic acid 610 $a3D printing 610 $anano-resolution 610 $aarbitrary distribution 610 $amultimaterials 610 $adeposition surface 610 $arapidity 610 $alarge scale 610 $aconjugated polymers 610 $apolyfullerenes 610 $aprocessing by convective self-assembly 610 $athin films and microstructure 610 $aphotoluminescence quenching 610 $ablock copolymers 610 $aself-assembly 610 $apolymer interface 610 $ananostructure metrology 610 $aline edge roughness LER 610 $a(S)TEM 610 $aSTEM-EELS of PS and PMMA 610 $adirected self-assembly 610 $ananospheres lithography 610 $acolloidal nanospheres 610 $adirect laser-writing 610 $adirected self-assembly (DSA) 610 $ablock copolymers (BCPs) 610 $achemo-epitaxy 610 $apolystyrene-block-polymethylmethacrylate (PS-b-PMMA) 610 $aline/space patterning 610 $aline edge roughness (LER) 610 $aline width roughness (LWR) 610 $asequential infiltration synthesis 610 $ablock copolymer 610 $ananoparticles 610 $acolloidal clusters 610 $acolloidal molecules 610 $asedimentation 610 $aseparation 610 $aclassification of nanoparticles 610 $aanalytical centrifugation 610 $adifferential centrifugal sedimentation 610 $adisk centrifuge 610 $adensity gradient centrifugation 615 7$aTechnology: general issues 700 $aFerrarese Lupi$b Federico$4edt$01289232 702 $aFerrarese Lupi$b Federico$4oth 906 $aBOOK 912 $a9910557487403321 996 $aNanoscale Self-Assembly: Nanopatterning and Metrology$93021118 997 $aUNINA