LEADER 04259nam  2201033z- 450 
001 9910557465703321
005 20220111
035   $a(CKB)5400000000043142
035   $a(oapen)https://directory.doabooks.org/handle/20.500.12854/76375
035   $a(oapen)doab76375
035   $a(EXLCZ)995400000000043142
100   $a20202201d2021      |y         0
101 0 $aeng
135   $aurmn|---annan
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 00$aCurrent Research in Thin Film Deposition$eApplications, Theory, Processing, and Characterisation
210   $aBasel, Switzerland$cMDPI - Multidisciplinary Digital Publishing Institute$d2021
215   $a1 online resource (154 p.)
311 08$a3-0365-0512-1 
311 08$a3-0365-0513-X 
330   $aToday, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.
517   $aCurrent Research in Thin Film Deposition 
606   $aTechnology: general issues$2bicssc
610   $aadhesion
610   $aaluminum coating
610   $aannealing
610   $aatomic layer deposition
610   $abrittle cracking
610   $acolor center absorption
610   $acrystal frequency
610   $adensity
610   $adiamond coatings
610   $adual functional-metalens
610   $ae-beam physical vapor deposition
610   $aflat film extrusion
610   $afluoropolymer
610   $afocusing
610   $afoil quality
610   $aFourier-transform infrared spectroscopy (FTIR)
610   $afracture toughness
610   $ainitiated chemical vapor deposition (iCVD)
610   $ainterfacial fatigue strength
610   $ainternal stress
610   $aliquid phase deposition (LPD)
610   $aMgF2
610   $amicro hollow glass spheres (MHGS)
610   $amicrocantilevers
610   $amilling
610   $aMOCVD
610   $an/a
610   $ananoindentation
610   $ananomechanics
610   $anc-Si:H
610   $anickel-chromium
610   $aoptical emission spectroscopy (OES)
610   $aPECVD
610   $aphysical vapor deposition
610   $aplasma diagnostics
610   $apolarization controlling
610   $aPVD coatings
610   $aQ-factor
610   $aquadruple mass spectrometry (QMS)
610   $aRaman spectroscopy
610   $aresidual stresses
610   $aresonant frequency
610   $aRF-PECVD
610   $ascandium stabilized zirconia thin films
610   $ashear modulus
610   $asolid micro glass spheres (SMGS)
610   $asplitting
610   $astress
610   $asuperhydrophobic
610   $athin film
610   $athin film thermocouples
610   $athin films ceramics
610   $aVI/III ratio
610   $aX-ray diffraction
610   $aX-ray diffraction spectroscopy (XRD)
610   $aYoung's modulus
610   $a?-Ga2O3
615  7$aTechnology: general issues
700   $aBirney$b Ross$4edt$01309579
702   $aBirney$b Ross$4oth
906   $aBOOK
912   $a9910557465703321
996   $aCurrent Research in Thin Film Deposition$93029413
997   $aUNINA