LEADER 04222nam 2201009z- 450 001 9910557465703321 005 20231214133203.0 035 $a(CKB)5400000000043142 035 $a(oapen)https://directory.doabooks.org/handle/20.500.12854/76375 035 $a(EXLCZ)995400000000043142 100 $a20202201d2021 |y 0 101 0 $aeng 135 $aurmn|---annan 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aCurrent Research in Thin Film Deposition$eApplications, Theory, Processing, and Characterisation 210 $aBasel, Switzerland$cMDPI - Multidisciplinary Digital Publishing Institute$d2021 215 $a1 electronic resource (154 p.) 311 $a3-0365-0512-1 311 $a3-0365-0513-X 330 $aToday, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology. 517 $aCurrent Research in Thin Film Deposition 606 $aTechnology: general issues$2bicssc 610 $aPECVD 610 $aplasma diagnostics 610 $anc-Si:H 610 $aRF-PECVD 610 $aFourier-transform infrared spectroscopy (FTIR) 610 $aquadruple mass spectrometry (QMS) 610 $aoptical emission spectroscopy (OES) 610 $aX-ray diffraction spectroscopy (XRD) 610 $amicro hollow glass spheres (MHGS) 610 $asolid micro glass spheres (SMGS) 610 $aliquid phase deposition (LPD) 610 $aaluminum coating 610 $a?-Ga2O3 610 $aMOCVD 610 $aVI/III ratio 610 $ascandium stabilized zirconia thin films 610 $ae-beam physical vapor deposition 610 $athin films ceramics 610 $aRaman spectroscopy 610 $aX-ray diffraction 610 $ainitiated chemical vapor deposition (iCVD) 610 $asuperhydrophobic 610 $afluoropolymer 610 $athin film 610 $aatomic layer deposition 610 $ananomechanics 610 $aYoung's modulus 610 $ashear modulus 610 $aresonant frequency 610 $aQ-factor 610 $amicrocantilevers 610 $ainternal stress 610 $anickel-chromium 610 $athin film thermocouples 610 $aphysical vapor deposition 610 $aflat film extrusion 610 $afoil quality 610 $aMgF2 610 $acolor center absorption 610 $adensity 610 $acrystal frequency 610 $astress 610 $aadhesion 610 $apolarization controlling 610 $adual functional-metalens 610 $afocusing 610 $asplitting 610 $aPVD coatings 610 $ananoindentation 610 $abrittle cracking 610 $afracture toughness 610 $adiamond coatings 610 $aresidual stresses 610 $ainterfacial fatigue strength 610 $aannealing 610 $amilling 615 7$aTechnology: general issues 700 $aBirney$b Ross$4edt$01309579 702 $aBirney$b Ross$4oth 906 $aBOOK 912 $a9910557465703321 996 $aCurrent Research in Thin Film Deposition$93029413 997 $aUNINA