LEADER 01478nam 2200433 450 001 9910554862703321 005 20220920132722.0 010 $a1-119-82688-8 010 $a1-119-82690-X 010 $a1-119-82689-6 035 $a(MiAaPQ)EBC6883652 035 $a(Au-PeEL)EBL6883652 035 $a(CKB)21069106300041 035 $a(PPN)264345649 035 $a(EXLCZ)9921069106300041 100 $a20220920d2022 uy 0 101 0 $aeng 135 $aurcnu|||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aMicrowave plasma sources and methods in processing technology /$fLadislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden 210 1$aHoboken, New Jersey :$cJohn Wiley & Sons,$d[2022] 210 4$dİ2022 215 $a1 online resource (262 pages) 311 08$aPrint version: Bardos, Ladislav Microwave Plasma Sources and Methods in Processing Technology Newark : John Wiley & Sons, Incorporated,c2022 9781119826873 320 $aIncludes bibliographical references and index. 606 $aElectromagnetism 615 0$aElectromagnetism. 676 $a660.044 700 $aBardos$b Ladislav$f1947-$01258930 702 $aBarankova$b Hana$f1951- 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910554862703321 996 $aMicrowave plasma sources and methods in processing technology$92917426 997 $aUNINA