LEADER 02235nam  2200553   450 
001 9910463096103321
005 20170821160507.0
010   $a1-60805-156-0
035   $a(CKB)2670000000400497
035   $a(EBL)1310821
035   $a(OCoLC)854975260
035   $a(SSID)ssj0001163788
035   $a(PQKBManifestationID)11654830
035   $a(PQKBTitleCode)TC0001163788
035   $a(PQKBWorkID)11163736
035   $a(PQKB)11718435
035   $a(MiAaPQ)EBC1310821
035   $a(EXLCZ)992670000000400497
100   $a20111102d2013      uy             0
101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 00$aMetallic oxynitride thin films by reactive sputtering and related deposition methods $eprocesses, properties and applications /$fedited by Filipe Vaz, Nicolas Martin & Martin Fenker
210  1$aSharjah, United Arab Emirates ;$aOak Park, Illinois :$cBentham Science Publishers,$d[2013]
210  4$dİ2013
215   $a1 online resource (363 p.)
300   $aDescription based upon print version of record.
311   $a1-60805-157-9 
320   $aIncludes bibliographical references and indexes.
327   $aCover; Title; Contents; About the Editors; Foreword; Preface; List of Contributors; Part 1; Chapter 01; Chapter 02; Chapter 03; Part 2; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Part 3; Chapter 09; Chapter 10; Chapter 11; Chapter 12; Author index; Subject index
330   $aThis e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes.
606   $aThin films
606   $aMetals
608   $aElectronic books.
615  0$aThin films.
615  0$aMetals.
676   $a660.2815
701   $aVaz$b Filipe$0983092
701   $aMartin$b Nicolas$0408923
701   $aFenker$b Martin$0983093
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910463096103321
996   $aMetallic oxynitride thin films by reactive sputtering and related deposition methods$92243847
997   $aUNINA