LEADER 00898nam0-2200325---450- 001 990008237740403321 005 20070201112119.0 010 $a3-89678-239-8 035 $a000823774 035 $aFED01000823774 035 $a(Aleph)000823774FED01 035 $a000823774 100 $a20051130d2003----km-y0itay50------ba 101 0 $ager 102 $aDE 105 $aa---y---001yy 200 1 $aLuxus im alten Rom$edie Schwelgerei, das süsse Gift...$fKarl-Wilhelm Weeber 210 $aDarmstadt$cPrimus$d2003 215 $a176 p.$cill.$d28 cm 676 $a937 700 1$aWeeber,$bKarl-Wilhelm$0289929 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990008237740403321 952 $a937 WEE 1$b54879 Bibl.$fFLFBC 952 $aDDR-XXVII B 101$b8648 ddr$fDDR$m21-8321 959 $aFLFBC 959 $aDDR 996 $aLuxus im alten Rom$9737678 997 $aUNINA LEADER 00812nam0-22002891i-450- 001 990003150920403321 035 $a000315092 035 $aFED01000315092 035 $a(Aleph)000315092FED01 035 $a000315092 100 $a20000920d--------km-y0itay50------ba 101 0 $aita 102 $aIT 200 1 $aPairs Trading$ePerformance of a Relative Value Arbitrage Rule$fEvan G. Gatev, William N. Goetzmann, K. 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Introduction -- 2. The interaction of electrons with solid materials -- 3. AES methodologies -- 4. Instrumentation for auger analysis -- 5. Auger electron spectroscopy in materials analysis -- 6. Analytical methods for the characterization of materials -- Appendix 1. Abbreviations and acronyms -- Appendix 2. Quantum numbers -- Appendix 3. Comparison of surface and thin film analysis techniques -- Appendix 4. Standardization in surface analysis -- Appendix 5. Sources of the figures -- Further reading -- Index. 330 3 $aAuger electron spectroscopy (AES) is capable of providing elemental composition and, in some restricted cases, chemical bonding information for the elements present near the surface of solid materials. The surface specificity of this technique is such that only atoms in the top 5 to 10 nm are detected. The great strength of AES is its ability to provide this information with excellent spatial resolution (down to <10 nm). It can be used to provide elemental maps of the surface, which gives rise to the term scanning Auger microscopy (SAM). When used in combination with a source of high-energy ions, it provides elemental depth profiles to depths of up to a few micrometers. The use of AES and SAM for the characterization of a wide range of technological materials is discussed. These include metals and alloys, semiconductors, nanostructures, and insulators. Its value as a tool for high- resolution elemental imaging and compositional depth profiling is illustrated. The application of the technique for obtaining compositional information from the surfaces, interfaces, and thin film structures of technological and engineering materials is demonstrated. This volume also describes the basic physical principles of AES in simple, largely qualitative, terms understandable by any undergraduate science or engineering student. Major components of typical Auger spectrometers are also described because an understanding of the instrumentation is important to anyone wishing to become a skilled analyst. Mention is also made of other types of analysis for which an Auger electron spectrometer may be used, for example, secondary electron microscopy, backscattered electron imaging, and X-ray spectroscopy. The relationship between AES and other analysis techniques is also discussed. 410 0$aMaterials characterization and analysis collection. 606 $aElectron spectroscopy 608 $aElectronic books. 615 0$aElectron spectroscopy. 676 $a543.0858 700 $aWolstenholme$b John$0908535 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910460798303321 996 $aAuger electron spectroscopy$92032041 997 $aUNINA