LEADER 01005nam0-22003251i-450- 001 990007986000403321 005 20050314165320.0 010 $a88-15-09651-5 035 $a000798600 035 $aFED01000798600 035 $a(Aleph)000798600FED01 035 $a000798600 100 $a20050117d2004----km-y0itay50------ba 101 0 $aita 102 $aIT 105 $a----a---001yy 200 1 $a<>direzione spirituale tra medioevo ed età moderna$fa cura di Michela Catto 210 $aBologna$cil Mulino$d2004 215 $a361 p.$d23 cm 225 1 $aAnnali dell'Istituto storico italo-germanico in Trento$iQuaderno$v63 610 0 $aDirezione spirituale$aAssistenza spirituale 676 $a253.53$v21$zita 702 1$aCatto,$bMichela 801 0$aIT$bUNINA$c20050117$gRICA$2UNIMARC 901 $aBK 912 $a990007986000403321 952 $a253 CAT 1$bBibl.50333$fFLFBC 959 $aFLFBC 996 $aDirezione spirituale tra medioevo ed età moderna$9311026 997 $aUNINA LEADER 05391nam 2200709Ia 450 001 9910457850803321 005 20200520144314.0 010 $a1-280-59350-4 010 $a9786613623331 010 $a0-19-992099-0 035 $a(CKB)2550000000089311 035 $a(EBL)886626 035 $a(OCoLC)777268040 035 $a(SSID)ssj0000638917 035 $a(PQKBManifestationID)11408673 035 $a(PQKBTitleCode)TC0000638917 035 $a(PQKBWorkID)10598661 035 $a(PQKB)11077483 035 $a(MiAaPQ)EBC886626 035 $a(Au-PeEL)EBL886626 035 $a(CaPaEBR)ebr10532647 035 $a(CaONFJC)MIL362333 035 $a(EXLCZ)992550000000089311 100 $a20110808d2011 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aNanofabrication using focused ion and electron beams$b[electronic resource] $eprinciples and applications /$fedited by Ivo Utke, Stanislav Moshkalev, Phillip Russell 210 $aOxford ;$aNew York $cOxford University Press$d2011 215 $a1 online resource (830 p.) 225 0 $aNanomanufacturing series ;$vv. 1 300 $aDescription based upon print version of record. 311 $a0-19-973421-6 327 $aCover; Contents; Foreword; Preface; Contributors; INTRODUCTION; I-1.The Historical Development of Electron Beam Induced Deposition and Etching: From Carbonaceous to Functional Materials; I-2. Historical Evolution of FIB Instrumentation and Technology: From Circuit Editing to Nanoprototyping; PART I: FUNDAMENTALS AND MODELS; 1.The Theory of Bright Field Electron and Field Ion Emission Sources; 2. How to Select Compounds for Focused Charged Particle Beam Assisted Etching and Deposition; 3. Gas Injection Systems for FEB and FIB Processing Theory and Experiment 327 $a4. Fundamentals of Interactions of Electrons with Molecules5. Simulation of Focused Ion Beam Milling; 6. FEB and FIB Continuum Models for One Adsorbate Species; 7. Continuum Modeling of Electron Beam Induced Processes; 8. Monte Carlo Method in FEBID Process Simulations; PART II: APPLICATIONS; 9. Focused Electron Beam Induced Processing (FEBIP) for Industrial Applications; 10. Focused Ion Beam and DualBeamTMTechnology Applied to Nanoprototyping; 11. Review of FIB Tomography; 12. In situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing 327 $a13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles14. Electron- and Ion-Assisted Metal Deposition for the Fabrication of Nanodevices Based on Individual Nanowires; 15. Focused Ion Beam Fabrication of Carbon Nanotube and ZnO Nanodevices; 16. Focused Ion and Electron Beam Induced Deposition of Magnetic Nanostructures; 17. Metal Films and Nanowires Deposited by FIB and FEB for Nanofabrication and Nanocontacting; 18. FIB Etching for Photonic Device Applications; 19. FIB etching of InP for Rapid Prototyping of Photonic Crystals 327 $a20. Applications of FIB for Rapid Prototyping of Photonic Devices, Fabrication of Nanosieves, Nanowires, and Nanoantennas21. Focused Particle Beam Induced Deposition of Silicon Dioxide; 22. Growth and Characterization of FEB-Deposited Suspended Nanostructures; 23. Electrical Transport Properties of Metallic Nanowires and Nanoconstrictions Created with FIB; 24. Structure-Property Relationship of Electronic Transport in FEBID Structures; 25. Characterization and Modification of Nanostructured Carbon Materials Using FIB and FEB 327 $a26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes27. Nanofabrication Using Electron Beam Lithography Processes; PART III: PROSPECTIVES; F-1. Focused Beam Processing-New BeamTechnologies-New Challenges in Process Development and Nanofabrication; Index; A; B; C; D; E; F; G; H; I; J; K; L; M; N; O; P; Q; R; S; T; U; V; W; X; Y; Z 330 $aNanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabr 410 0$aOxford Series in Nanomanufacturing 606 $aNanostructured materials 606 $aNanotechnology 606 $aElectron beams$xIndustrial applications 606 $aIon bombardment$xIndustrial applications 608 $aElectronic books. 615 0$aNanostructured materials. 615 0$aNanotechnology. 615 0$aElectron beams$xIndustrial applications. 615 0$aIon bombardment$xIndustrial applications. 676 $a620.1/15 701 $aUtke$b Ivo$0934858 701 $aMoshkalev$b Stanislav$0934859 701 $aRussell$b Phillip$f1955-$0934860 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910457850803321 996 $aNanofabrication using focused ion and electron beams$92105269 997 $aUNINA