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010   $a1-280-21147-4
010   $a9786610211470
010   $a0-309-58395-0
010   $a0-585-14945-3
035   $a(CKB)110986584751132
035   $a(OCoLC)44965115
035   $a(CaPaEBR)ebrary10055022
035   $a(SSID)ssj0000109385
035   $a(PQKBManifestationID)11128770
035   $a(PQKBTitleCode)TC0000109385
035   $a(PQKBWorkID)10046005
035   $a(PQKB)10649986
035   $a(MiAaPQ)EBC3376029
035   $a(Au-PeEL)EBL3376029
035   $a(CaPaEBR)ebr10055022
035   $a(CaONFJC)MIL21147
035   $a(OCoLC)923260597
035   $a(EXLCZ)99110986584751132
100   $a19920422d1992      uy             0
101 0 $aeng
135   $aurcn|||||||||
181   $ctxt
182   $cc
183   $acr
200 10$aBeam technologies for integrated processing$b[electronic resource] $ereport of the Committee on Beam Technologies: Opportunities in Attaining Fully-Integrated Processing Systems, National Materials Advisory Board, Commission on Engineering and Technical Systems, National Research Council
210   $aWashington, D.C. $cNational Academy Press$d1992
215   $a1 online resource (101 p.) 
300   $a"NMAB-461."
311   $a0-309-04635-1 
320   $aIncludes bibliographical references.
606   $aMicroelectronics industry
606   $aMolecular beams$xIndustrial applications
606   $aMicroelectronics$xMaterials
606   $aPlasma-enhanced chemical vapor deposition$xIndustrial applications
608   $aElectronic books.
615  0$aMicroelectronics industry.
615  0$aMolecular beams$xIndustrial applications.
615  0$aMicroelectronics$xMaterials.
615  0$aPlasma-enhanced chemical vapor deposition$xIndustrial applications.
676   $a621.381
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910455972503321
996   $aBeam technologies for integrated processing$92087903
997   $aUNINA