LEADER 03779nam 2200601Ia 450 001 9910437808203321 005 20200520144314.0 010 $a1-84996-408-4 024 7 $a10.1007/978-1-84996-408-1 035 $a(CKB)2670000000530273 035 $a(EBL)1205461 035 $a(OCoLC)828410734 035 $a(SSID)ssj0000879499 035 $a(PQKBManifestationID)11546006 035 $a(PQKBTitleCode)TC0000879499 035 $a(PQKBWorkID)10851749 035 $a(PQKB)10358597 035 $a(DE-He213)978-1-84996-408-1 035 $a(MiAaPQ)EBC1205461 035 $a(PPN)168306212 035 $a(EXLCZ)992670000000530273 100 $a20130225d2013 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aPolishing of diamond materials $emechanisms, modeling and implementation /$fYiqing Chen, Liangchi Zhang 205 $a1st ed. 2013. 210 $aLondon ;$aNew York $cSpringer$dc2013 215 $a1 online resource (174 p.) 225 0$aEngineering materials and processes 300 $aDescription based upon print version of record. 311 $a1-84996-407-6 311 $a1-4471-5906-3 320 $aIncludes bibliographical references and index. 327 $aUnderstanding of Material Removal Mechanisms -- Mechanical Polishing -- Chemo-mechanical Polishing -- Thermo-chemical Polishing -- High Energy Beam Polishing -- Electric Discharge Machining (EDM) Polishing -- Dynamic Friction Polishing -- Comparison of Various Polishing Techniques. 330 $aDiamond has a unique combination of properties, such as the highest hardness and thermal conductivity among any known material, high electrical resistivity, a large optical band gap and a high transmission, good resistance to chemical erosion, low adhesion and friction, and extremely low thermal expansion coefficient. As such, diamond has been a desirable material in a wide range of applications in mechanical, chemical, optical, thermal and electrical engineering. In many of the cases, the surface of a diamond component or element must have a superior finish, often down to a surface roughness of nanometers. Nevertheless, due to its extreme hardness and chemical inertness, the polishing of diamond and its composites has been a sophisticated process. Polishing of Diamond Materials will provide a state-of-the-art analysis, both theoretically and experimentally, of the most commonly used polishing techniques for mono/poly-crystalline diamond and chemical vapour deposition (CVD) diamond films, including mechanical, chemo-mechanical, thermo-chemical, high energy beam, dynamic friction and other polishing techniques. The in-depth discussions will be on the polishing mechanisms, possible modelling, material removal rate and the quality control of these techniques. A comparison of their advantages and drawbacks will be carried out to provide the reader with a useful guideline for the selection and implementation of these polishing techniques. Polishing of Diamond Materials will be of interest to researchers and engineers in hard materials and precision manufacturing, industry diamond suppliers, diamond jewellery suppliers and postgraduate students in the area of precision manufacturing. 410 0$aEngineering Materials and Processes,$x1619-0181 606 $aDiamond turning 606 $aDiamond thin films 615 0$aDiamond turning. 615 0$aDiamond thin films. 676 $a553.82 700 $aChen$b Yiqing$01063509 701 $aZhang$b L. C$g(Liangchi)$01659157 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910437808203321 996 $aPolishing of diamond materials$94184405 997 $aUNINA