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101 0 $aeng
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200 1 $a<>rational expectations approach to macroeconometrics$etesting policy ineffectiveness and efficient-markets models$fFrederic S. Mishkin
210 $aChicago$aLondon$cUniversity of Chicago press$dc1983
215 $aXII, 172 p.$d24 cm
225 2 $a<>National bureau of economic research monograph
410 0$12001$a<>National bureau of economic research monograph
500 10$a<>rational expectations approach to macroeconometrics$946107
610 1 $aMacroeconomia
610 1 $aEconometria
676 $a330.015195$v21$9Economia. Econometria
700 1$aMishkin,$bFrederic S.$0115649
801 0$aIT$bUNIPARTHENOPE$c20090213$gRICA$2UNIMARC
912 $a000022983
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996 $aRational expectations approach to macroeconometrics$946107
997 $aUNIPARTHENOPE
LEADER 03723nam 2200589Ia 450
001 9910437802903321
005 20200520144314.0
010 $a3-642-27381-5
024 7 $a10.1007/978-3-642-27381-0
035 $a(CKB)2670000000279691
035 $a(EBL)1106119
035 $a(OCoLC)823722643
035 $a(SSID)ssj0000798329
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035 $a(PQKBTitleCode)TC0000798329
035 $a(PQKBWorkID)10739053
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035 $a(DE-He213)978-3-642-27381-0
035 $a(MiAaPQ)EBC1106119
035 $a(PPN)168310600
035 $a(EXLCZ)992670000000279691
100 $a20121025d2012 uy 0
101 0 $aeng
135 $aur|n|---|||||
181 $ctxt
182 $cc
183 $acr
200 10$aAuger- and x-ray photoelectron spectroscopy in materials science $ea user-oriented guide /$fSiegfried Hofmann
205 $a1st ed. 2013.
210 $aBerlin ;$aHeidelberg $cSpringer$d2012
215 $a1 online resource (543 p.)
225 0$aSpringer series in surface sciences ;$v49
300 $aDescription based upon print version of record.
311 $a3-642-43173-9
311 $a3-642-27380-7
320 $aIncludes bibliographical references and index.
327 $aOutline of the Technique/Brief Description -- Theoretical Background -- Instrumentation -- Practical Surface Analysis with AES -- Data Evaluation/Quantification -- Problem Solving with AES (Examples).
330 $aTo anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. .
410 0$aSpringer Series in Surface Sciences,$x0931-5195 ;$v49
606 $aX-ray photoelectron spectroscopy
606 $aAuger effect
615 0$aX-ray photoelectron spectroscopy.
615 0$aAuger effect.
676 $a543.62
700 $aHofmann$b S$g(Siegfried)$01761717
801 0$bMiAaPQ
801 1$bMiAaPQ
801 2$bMiAaPQ
906 $aBOOK
912 $a9910437802903321
996 $aAuger- and x-ray photoelectron spectroscopy in materials science$94201320
997 $aUNINA