LEADER 03723nam 2200589Ia 450 001 9910437802903321 005 20200520144314.0 010 $a3-642-27381-5 024 7 $a10.1007/978-3-642-27381-0 035 $a(CKB)2670000000279691 035 $a(EBL)1106119 035 $a(OCoLC)823722643 035 $a(SSID)ssj0000798329 035 $a(PQKBManifestationID)11442875 035 $a(PQKBTitleCode)TC0000798329 035 $a(PQKBWorkID)10739053 035 $a(PQKB)10788302 035 $a(DE-He213)978-3-642-27381-0 035 $a(MiAaPQ)EBC1106119 035 $a(PPN)168310600 035 $a(EXLCZ)992670000000279691 100 $a20121025d2012 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aAuger- and x-ray photoelectron spectroscopy in materials science $ea user-oriented guide /$fSiegfried Hofmann 205 $a1st ed. 2013. 210 $aBerlin ;$aHeidelberg $cSpringer$d2012 215 $a1 online resource (543 p.) 225 0$aSpringer series in surface sciences ;$v49 300 $aDescription based upon print version of record. 311 $a3-642-43173-9 311 $a3-642-27380-7 320 $aIncludes bibliographical references and index. 327 $aOutline of the Technique/Brief Description -- Theoretical Background -- Instrumentation -- Practical Surface Analysis with AES -- Data Evaluation/Quantification -- Problem Solving with AES (Examples). 330 $aTo anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.  . 410 0$aSpringer Series in Surface Sciences,$x0931-5195 ;$v49 606 $aX-ray photoelectron spectroscopy 606 $aAuger effect 615 0$aX-ray photoelectron spectroscopy. 615 0$aAuger effect. 676 $a543.62 700 $aHofmann$b S$g(Siegfried)$01761717 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910437802903321 996 $aAuger- and x-ray photoelectron spectroscopy in materials science$94201320 997 $aUNINA