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100   $a20200720d2020      u|         0
101 0 $aeng
135   $aurnn|008mamaa
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 10$aEpitaxy of Semiconductors $ePhysics and Fabrication of Heterostructures /$fby Udo W. Pohl
205   $a2nd ed. 2020.
210  1$aCham :$cSpringer International Publishing :$cImprint: Springer,$d2020.
215   $a1 online resource (XX, 535 p. 322 illus., 145 illus. in color.) 
225 1 $aGraduate Texts in Physics,$x1868-4513
311 08$a3-030-43868-6 
320   $aIncludes bibliographical references and index.
327   $aIntroduction -- Structural Properties of Heterostructures -- Electronic Properties of Heterostructures -- Thermodynamics of Epitaxial Layer-Growth -- Atomistic Aspects of Epitaxial Layer-Growth -- In situ Growth Monitoring -- Application of Surfactants -- Doping, Diffusion, and Contacts -- Methods of Epitaxy -- Special Growth Techniques.
330   $aThe extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today?s advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations.
410  0$aGraduate Texts in Physics,$x1868-4513
606   $aSemiconductors
606   $aOptical materials
606   $aElectronics$xMaterials
606   $aChemistry, Physical and theoretical
606   $aCrystallography
606   $aNanotechnology
606   $aMicrowaves
606   $aOptical engineering
606   $aSemiconductors$3https://scigraph.springernature.com/ontologies/product-market-codes/P25150
606   $aOptical and Electronic Materials$3https://scigraph.springernature.com/ontologies/product-market-codes/Z12000
606   $aPhysical Chemistry$3https://scigraph.springernature.com/ontologies/product-market-codes/C21001
606   $aCrystallography and Scattering Methods$3https://scigraph.springernature.com/ontologies/product-market-codes/P25056
606   $aNanotechnology and Microengineering$3https://scigraph.springernature.com/ontologies/product-market-codes/T18000
606   $aMicrowaves, RF and Optical Engineering$3https://scigraph.springernature.com/ontologies/product-market-codes/T24019
615  0$aSemiconductors.
615  0$aOptical materials.
615  0$aElectronics$xMaterials.
615  0$aChemistry, Physical and theoretical.
615  0$aCrystallography.
615  0$aNanotechnology.
615  0$aMicrowaves.
615  0$aOptical engineering.
615 14$aSemiconductors.
615 24$aOptical and Electronic Materials.
615 24$aPhysical Chemistry.
615 24$aCrystallography and Scattering Methods.
615 24$aNanotechnology and Microengineering.
615 24$aMicrowaves, RF and Optical Engineering.
676   $a548.5
676   $a548.5
700   $aPohl$b Udo W$4aut$4http://id.loc.gov/vocabulary/relators/aut$0842135
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910412153803321
996   $aEpitaxy of Semiconductors$91923107
997   $aUNINA