LEADER 01088nam0-2200337 --450 
001 9910407259903321
005 20200713132600.0
010   $a978-88-506-5569-4$bvol. 1
010   $a978-88-506-5570-0$bvol. 2
010   $a978-88-506-5571-7$bvol. 3
100   $a20200713d2018----kmuy0itay5050    ba
101   $aita
102   $aIT
105   $aa       001yy
200 1 $aBirra$fTullio Zangrando, Mirco Marconi
210   $aMilano$cEdagricole$d2018
215   $a3 v.$cill.$d26 cm
327 1 $a1.: Storia della birra e degli stili birrari$a2.: Materie prime, tecnologie, stili$a3.: Degustazione e servizio, comunicazione, formazione
610 0 $aBirra
676   $a663.42$v23$zita
700  1$aZangrando,$bTullio$0787101
701  1$aMarconi,$bMirco$078826
801  0$aIT$bUNINA$gREICAT$2UNIMARC
901   $aBK
912   $a9910407259903321
952   $a60 663.42 ZANT 2018-1$b097/2020$fFAGBC
952   $a60 663.42 ZANT 2018-2$b098/2020$fFAGBC
952   $a60 663.42 ZANT 2018-3$b099/2020$fFAGBC
959   $aFAGBC
996   $aBirra$91753395
997   $aUNINA

LEADER 02284nam  22005531  450 
001 9910463008803321
005 20200520144314.0
010   $a1-60805-790-9
035   $a(CKB)2670000000493936
035   $a(EBL)1572232
035   $a(SSID)ssj0001161124
035   $a(PQKBManifestationID)11633646
035   $a(PQKBTitleCode)TC0001161124
035   $a(PQKBWorkID)11131683
035   $a(PQKB)10924861
035   $a(MiAaPQ)EBC1572232
035   $a(Au-PeEL)EBL1572232
035   $a(CaPaEBR)ebr10817741
035   $a(OCoLC)865331834
035   $a(EXLCZ)992670000000493936
100   $a20121011d2013      uy             1
101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 10$aIon implantation and activation$hVolume 2 /$fKunihiro Suzuki
210  1$aSharjah :$cBentham Science Publishers,$d2013.
215   $a1 online resource (171 p.)
225 1 $aIon Implantation and Activation
300   $aDescription based upon print version of record.
311   $a1-60805-791-7 
320   $aIncludes bibliographical references and index.
327   $aCover; Title; EUL; Contents; Preface; Acknowledgement; Chapter 01; Chapter 02; Chapter 03; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Chapter 09; Index
330   $aIon Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories.Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling.
410  0$aIon Implantation and Activation
606   $aIon implantation
606   $aIon accelerators
608   $aElectronic books.
615  0$aIon implantation.
615  0$aIon accelerators.
700   $aSuzuki$b Kunihiro$0901569
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910463008803321
996   $aIon implantation and activation$92015010
997   $aUNINA