LEADER 01065nam0-22003131i-450- 001 990005459200403321 005 19990530 035 $a000545920 035 $aFED01000545920 035 $a(Aleph)000545920FED01 035 $a000545920 100 $a19990530d1972----km-y0itay50------ba 101 0 $afre 105 $ay-------001yy 200 1 $aCorrespondance du nonce en France Prospero Santa Croce (1552-1554)$fintroduction par Francesco Giannetto$gtexte TditT et annotT par J. Lestocquoy 210 $aRome$cPresses de l'UniversitT Grègorienne$cE. de Boccard$d1972 210 $aParis 215 $a268 p.$d25 cm 225 1 $aActa nuntiaturae gallicae$v9 700 1$aSanta Croce,$bProspero : di$c$0399260 702 1$aGiannetto,$bFrancesco 702 1$aLestocquoy,$bJean 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990005459200403321 952 $aST.MED.MOD. 3554$bST.MED-MOD. 6488$fFLFBC 959 $aFLFBC 996 $aCorrespondance du nonce en France Prospero Santa Croce (1552-1554$9588577 997 $aUNINA LEADER 01321oam 2200373Ka 450 001 9910692851903321 005 20030314140805.0 035 $a(CKB)5470000002356966 035 $a(OCoLC)51555763 035 9 $aocm51555763 035 $a(OCoLC)995470000002356966 035 $a(EXLCZ)995470000002356966 100 $a20030131d2001 ua 0 101 0 $aeng 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 13$aAn introduction to content analysis$b[electronic resource] /$fStemler, Steve 210 1$aCollege Park, MD :$cERIC Clearinghouse on Assessment and Evaluation,$d[2001] 225 1 $aERIC/AE digest series ;$vEDO-TM-01-06 300 $aTitle from title screen (viewed on Jan. 31, 2003). 300 $aDistributed to depository libraries in microfiche (1 microfiche), shipping list no.: 2003-0085-M. 606 $aLanguage and languages$xWord frequency 606 $aResearch$xMethodology 615 0$aLanguage and languages$xWord frequency. 615 0$aResearch$xMethodology. 700 $aStemler$b Steve$01382854 712 02$aERIC Clearinghouse on Assessment and Evaluation. 801 0$bGPO 801 1$bGPO 906 $aBOOK 912 $a9910692851903321 996 $aAn introduction to content analysis$93426946 997 $aUNINA LEADER 04033 am 2200769 n 450 001 9910340848903321 005 20131008 010 $a2-7099-1812-9 024 7 $a10.4000/books.irdeditions.3522 035 $a(CKB)4340000000013127 035 $a(FrMaCLE)OB-irdeditions-3522 035 $a(oapen)https://directory.doabooks.org/handle/20.500.12854/48501 035 $a(PPN)267949588 035 $a(EXLCZ)994340000000013127 100 $a20131202j|||||||| ||| 0 101 0 $afre 135 $auu||||||m|||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aGéopolitique et environnement $eLes leçons de l?expérience malgache /$fHervé Rakoto Ramiarantsoa, Chantal Blanc-Pamard, Florence Pinton 210 $aMarseille $cIRD Éditions$d2013 215 $a1 online resource (296 p.) 311 $a2-7099-1733-5 330 $aLa globalisation des politiques environnementales ne produit pas les mêmes effets dans tous les pays du Sud. Dans le même temps persiste la difficulté à penser de façon renouvelée les relations entre nature et société, entre conservation et développement, ce dont témoigne Rio + 20, la conférence des Nations unies pour le développement durable tenue en juin 2012. Dans ce contexte, Madagascar, pays fortement engagé dans une démarche de conservation de son patrimoine forestier, s?avère un cas d?école emblématique. Quels acteurs contrôlent les modalités de production et de mise en ?uvre des projets de valorisation de la forêt ? Par quelles institutions ces projets sont-ils financés ? Quelles retombées en termes de lutte contre la pauvreté peut-on en attendre ? À travers un regard géopolitique partagé, les auteurs de cet ouvrage, issus de disciplines et d?horizons divers, interrogent le processus de construction des politiques environnementales et analysent les relations entre science, politique et société, alors que s?est progressivement imposée une vision de plus en plus marchande de la nature. Cette publication s?adresse à tous ceux ? chercheurs, étudiants, praticiens du développement et décideurs ? qui explorent pistes et retours d?expériences sur les relations entre géopolitique et environnement. 517 $aGéopolitique et environnement 606 $aEnvironmental policy$zMadagascar 606 $aEconomic development$zMadagascar 606 $aSustainable development$zMadagascar 606 $aForest management$zMadagascar 606 $aNatural resources$zMadagascar 606 $aGeopolitics$zMadagascar 610 $avégétation 610 $aprotection de l?écosystème 610 $aconservation de la nature 610 $aenvironnement 610 $agestion de l?environnement 610 $aressources naturelles 615 0$aEnvironmental policy 615 0$aEconomic development 615 0$aSustainable development 615 0$aForest management 615 0$aNatural resources 615 0$aGeopolitics 700 $aBidaud$b Cécile$01316142 701 $aBlanc-Pamard$b Chantal$01232397 701 $aCarrière$b Stéphanie M$01286407 701 $aHervé$b Dominique$01301754 701 $aKull$b Christian A$01316143 701 $aMéral$b Philippe$01312061 701 $aPinton$b Florence$01301759 701 $aRakotoarijaona$b Jean Roger$01316144 701 $aRamamonjisoa$b Bruno Salomon$01316145 701 $aRambinintsaotra$b Saholy$01316146 701 $aRamiarantsoa$b Hervé Rakoto$01316147 701 $aRatiaray$b Ramarolanto$0357610 701 $aRazafinjara$b Aimé Lala$01316148 701 $aRazanaka$b Samuel$01316149 701 $aRodary$b Estienne$01284558 701 $aRakoto Ramiarantsoa$b Hervé$0411392 701 $aBlanc-Pamard$b Chantal$01232397 701 $aPinton$b Florence$01301759 801 0$bFR-FrMaCLE 906 $aBOOK 912 $a9910340848903321 996 $aGéopolitique et environnement$93032608 997 $aUNINA LEADER 05740nam 2200649 450 001 9910787025503321 005 20230803205526.0 010 $a3-03826-626-4 035 $a(CKB)3710000000251947 035 $a(EBL)1910939 035 $a(SSID)ssj0001388152 035 $a(PQKBManifestationID)12012402 035 $a(PQKBTitleCode)TC0001388152 035 $a(PQKBWorkID)11383563 035 $a(PQKB)11183159 035 $a(Au-PeEL)EBL1910939 035 $a(CaPaEBR)ebr10951269 035 $a(OCoLC)893677848 035 $a(MiAaPQ)EBC1910939 035 $a(EXLCZ)993710000000251947 100 $a20141016h20142014 uy 0 101 0 $aeng 135 $aurcnu|||||||| 181 $ctxt 182 $cc 183 $acr 200 10$aUltra clean processing of semiconductor surfaces XII $eselected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium /$fedited by Paul Mertens, Marc Meuris and Marc Heyns 210 1$aPfaffikon, Switzerland :$cTTP,$d2014. 210 2$aEnfield, New Hampshire :$cTrans Tech Publications Ltd,$d[date of distribution not identified] 210 4$d©2014 215 $a1 online resource (331 p.) 225 1 $aSolid State Phenomena,$x1662-7799 ;$vVolume 219 300 $aDescription based upon print version of record. 311 1 $a3-03835-242-X 320 $aIncludes bibliographical references at the end of each chapters and index. 327 $aUltra Clean Processing of Semiconductor Surfaces XII; Preface, Committee and Acknowledgement; Table of Contents; Chapter 1: Cleaning for FEOL Applications; Necessity of Cleaning and its Application in Future Memory Devices; Removal of Interfacial Layer in HfO2 Gate Stack by Post-Gate Cleaning Using NF3/NH3 Dry Cleaning Technique; Catalyst Assisted Low Temperature Pre Epitaxial Cleaning for Si and SiGe Surfaces; HF-Last Wet Clean in Combination with a Low Temperature GeH4-Assisted HCl In Situ Clean Prior to Si0.8Ge0.2-on-Si Epitaxial Growth 327 $aRetardation Phenomenon of Oxide Removal during the Formation of Dual Gate Oxide via PR-Mask Wet Etching Aluminum Reduction in SC1; Metal Removal Efficiency in Deep Submicron Trenches by Wet Chemicals; Impact of Surface Treatment of Si3N4 on Subsequent SiO2 Deposition; Operation of a New Electrolyzed Cell Using Boron Doped Diamond Electrodes ; Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area; InGaAs (110) Surface Cleaning Using Atomic Hydrogen; Surface Chemistry of GaAs(100) and InAs(100) Etching with Tartaric Acid; Nanoscale Etching and Reoxidation of InAs 327 $aPassivation of In Sb(100) with 1-Eicosanethiol Self-Assembled Monolayers Cross-Contamination Risk Evaluation during Fabrication of III-V Devices in a Silicon Processing Environment; Surface Cleaning of Graphene by CO2 Cluster; Chapter 3: Wet Etching for FEOL Applications; Process Control Challenges of Wet Etching Large MEMS Si Cavities; Wet Etch Rate Behavior of Poly-Si in TMAH Solution at Various Ambient Gas Conditions; Advanced Monitoring of TMAH Solution; Effect of Dissolved Oxygen for Advanced Wet Processing; Watermark Formation on Bare Silicon: Impact of Illumination and Substrate Doping 327 $aSelective Nitride Etching with Phosphoric and Sulfuric Acid Mixtures Using a Single-Wafer Wet Processor Single Wafer Selective Silicon Nitride Removal with Phosphoric Acid and Steam; Pt Etching Method at Low Temperature Using Electrolyzed Sulfuric Acid Solution; Nickel Selective Etch for Contacts on Ge Based Devices; Chapter 4: Wet Processing of High Aspect Ratio Structures; Study of Wetting of Nanostructures Using Decoration by Etching; Impact of Electrostatic Effects on Wet Etching Phenomenon in Nanoscale Region; Freeze Drying of High Aspect Ratio Structures 327 $aChapter 5: Fluid Dynamics, Cleaning Mechanics Effect of DI-Water Dilution and Etchant Arm Movement on Spinning Type Wet Etch; Effect of Nozzle Distance and Fluid Flow Rate in Jet Spray Wafer Cleaning Process; Effects of Chamber Pressure on the Performance of CO2 Beam Cleaning; Physical Chemistry of Water Droplets in Wafer Cleaning with Low Water Use; Metal Etch in Advanced Immersion Tank with Precision Uniformity Using Agitation and Wafer Rotation; Novel Slurry Injection System for Improved Slurry Flow and Reduced Defects in CMP 327 $aEffect of Viscoelasticity of PVA Brush on Friction during Post-CMP Cleaning: A Guideline for Nodule Configuration 330 $aCollection of selected, peer reviewed papers from the 12th InternationalSymposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications, Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications, Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics, Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: C 410 0$aDiffusion and defect data.$nPt. B,$pSolid state phenomena ;$vVolume 219. 606 $aSemiconductors$vCongresses 615 0$aSemiconductors 676 $a621.38152 702 $aMertens$b Paul 702 $aMeuris$b Marc 702 $aHeyns$b Marc 712 12$aInternational Symposium on Ultra Clean Processing of Semiconductor Surfaces 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910787025503321 996 $aUltra clean processing of semiconductor surfaces XII$93781921 997 $aUNINA