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200 00$aIntellectual property & technology law journal /$fedited by the Technology and Proprietary Rights group of Weil, Gotshal & Manges LLP
210   $aNew York, NY $cAspen Law & Business$dc2000-
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300   $aRefereed/Peer-reviewed
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311 08$aPrint version: Intellectual property & technology law journal / (DLC)---20012142- (OCoLC)60626188 1534-3618 
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