LEADER 04511nam 22008175 450 001 9910298970803321 005 20200706080324.0 010 $a3-662-43767-8 024 7 $a10.1007/978-3-662-43767-4 035 $a(CKB)3710000000342601 035 $a(EBL)1966046 035 $a(SSID)ssj0001424514 035 $a(PQKBManifestationID)11798393 035 $a(PQKBTitleCode)TC0001424514 035 $a(PQKBWorkID)11369590 035 $a(PQKB)11535392 035 $a(MiAaPQ)EBC1966046 035 $a(DE-He213)978-3-662-43767-4 035 $a(PPN)18351646X 035 $a(EXLCZ)993710000000342601 100 $a20150122d2014 u| 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aIT Quality Management /$fby Wolfgang W. Osterhage 205 $a1st ed. 2014. 210 1$aBerlin, Heidelberg :$cSpringer Berlin Heidelberg :$cImprint: Springer,$d2014. 215 $a1 online resource (139 p.) 300 $aDescription based upon print version of record. 311 $a3-662-43766-X 320 $aIncludes bibliographical references and index. 327 $aObjectives -- Project Organisation -- Quality Management in the Context of Acceptance -- Subproject Organisation Quality Management -- Acceptance Directive -- Methods of Data and Software Migration -- Special Cases -- Documentation -- Security Aspects -- Project Management -- Project Controlling -- References -- Subject Index. 330 $aIn a comprehensive approach this book covers the end-to-end process from request management to change management, error management and migration management to acceptance testing and final data clean up. It is based upon nearly twenty years of experience in tests, acceptance and certification, when introducing medium to large IT systems including complex software for administrations and industry in many countries. There exist a variety of methodologies with different characteristics having emanated from various schools and consultancies to support such activities. However, it is obvious that because of the diversity in organisational levels in companies the rigor of application of such methodologies quite often suffers with regard to more pragmatic approaches. In view of economic considerations this may be unavoidable. For this reason no new or consolidated methodology shall be presented but an approach oriented on practical criteria coming closer to reality and offering methods, which can provide assistance on a case-by-case basis. 606 $aComputer architecture 606 $aManagement information systems 606 $aComputer science 606 $aComputer software?Reusability 606 $aComputer organization 606 $aComputer system failures 606 $aDatabase management 606 $aComputer System Implementation$3https://scigraph.springernature.com/ontologies/product-market-codes/I13057 606 $aManagement of Computing and Information Systems$3https://scigraph.springernature.com/ontologies/product-market-codes/I24067 606 $aPerformance and Reliability$3https://scigraph.springernature.com/ontologies/product-market-codes/I12077 606 $aComputer Systems Organization and Communication Networks$3https://scigraph.springernature.com/ontologies/product-market-codes/I13006 606 $aSystem Performance and Evaluation$3https://scigraph.springernature.com/ontologies/product-market-codes/I13049 606 $aDatabase Management$3https://scigraph.springernature.com/ontologies/product-market-codes/I18024 615 0$aComputer architecture. 615 0$aManagement information systems. 615 0$aComputer science. 615 0$aComputer software?Reusability. 615 0$aComputer organization. 615 0$aComputer system failures. 615 0$aDatabase management. 615 14$aComputer System Implementation. 615 24$aManagement of Computing and Information Systems. 615 24$aPerformance and Reliability. 615 24$aComputer Systems Organization and Communication Networks. 615 24$aSystem Performance and Evaluation. 615 24$aDatabase Management. 676 $a003.3 676 $a004 676 $a004.24 676 $a004.6 676 $a005.74 700 $aOsterhage$b Wolfgang W$4aut$4http://id.loc.gov/vocabulary/relators/aut$0835227 906 $aBOOK 912 $a9910298970803321 996 $aIT Quality Management$92276651 997 $aUNINA LEADER 04437nam 2200661Ia 450 001 9911006794703321 005 20200520144314.0 010 $a9781680151008 010 $a1680151002 010 $a9780819492524 010 $a0819492523 024 7 $a10.1117/3.975276 035 $a(CKB)2670000000233339 035 $a(EBL)1224003 035 $a(SSID)ssj0000702203 035 $a(PQKBManifestationID)11416408 035 $a(PQKBTitleCode)TC0000702203 035 $a(PQKBWorkID)10679340 035 $a(PQKB)11258212 035 $a(MiAaPQ)EBC1224003 035 $a(OCoLC)805233701 035 $a(CaBNVSL)gtp00552709 035 $a(SPIE)9780819492524 035 $a(PPN)237370344 035 $a(Perlego)2605809 035 $a(EXLCZ)992670000000233339 100 $a20120807d2012 fy 0 101 0 $aeng 135 $aurbn||||m|||a 181 $ctxt 182 $cc 183 $acr 200 10$aOptical scattering $emeasurement and analysis /$fJohn C. Stover 205 $a3rd ed. 210 $aBellingham, Wash. $cSPIE$d2012 215 $a1 online resource (332 p.) 225 1 $aSPIE Press monograph ;$vPM224 300 $aDescription based upon print version of record. 311 08$a9780819492517 311 08$a0819492515 320 $aIncludes bibliographical references (p. 283-302) and index. 327 $aPreface to the first edition -- Preface to the second edition -- Acknowledgments for the second edition -- Preface to the third edition -- Acknowledgments for the third edition -- List of acronyms -- Chapter 1. Quantifying light scatter -- Chapter 2. Quantifying surface roughness -- Chapter 3. Scatter calculations and diffraction theory -- Chapter 4. Using Rayleigh-Rice to calculate smooth-surface statistics from the BRDF -- Chapter 5. Polarization of scattered light -- Chapter 6. Scattering models for discrete surface features -- Chapter 7. Instrumentation and measurement issues -- Chapter 8. Predicting scatter from roughness -- Chapter 9. Detection of discrete defects -- Chapter 10. Appearance and scattered light -- Chapter 11. Industrial applications -- Chapter 12. Published scatter standards -- Chapter 13. Scatter specifications -- Appendix A. Review of electromagnetic wave propagation -- Appendix B. Kirchhoff diffraction from sinusoidal gratings -- Appendix C. BSDF data -- Appendix D. Units -- References -- Works consulted. 330 $aThe first edition of this book concentrated on relating scatter from optically smooth surfaces to the microroughness on those surfaces. After spending six years in the semiconductor industry, Dr. Stover has updated and expanded the third edition. Newly included are scatter models for pits and particles as well as the use of wafer scanners to locate and size isolated surface features. New sections cover the multimillion-dollar wafer scanner business, establishing that microroughness is the noise, not the signal, in these systems. Scatter measurements, now routinely used to determine whether small-surface features are pits or particles and inspiring new technology that provides information on particle material, are also discussed. These new capabilities are now supported by a series of international standards, and a new chapter reviews those documents. New information on scatter from optically rough surfaces has also been added. Once the critical limit is exceeded, scatter cannot be used to determine surface-roughness statistics, but considerable information can still be obtained - especially when measurements are made on mass-produced products. Changes in measurement are covered, and the reader will find examples of scatter measurements made using a camera for a fraction of the cost and in a fraction of the time previously possible. The idea of relating scatter to surface appearance is also discussed, and appearance has its own short chapter. After all, beauty is in the eye of the beholder, and what we see is scattered light. 410 0$aSPIE monograph ;$v224. 606 $aLight$xScattering 606 $aOptics 615 0$aLight$xScattering. 615 0$aOptics. 676 $a535/.43 700 $aStover$b John C$0118720 712 02$aSociety of Photo-Optical Instrumentation Engineers. 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911006794703321 996 $aOptical scattering$94390547 997 $aUNINA