LEADER 03925nam 22006255 450 001 9910298459203321 005 20200705035149.0 010 $a3-658-11388-X 024 7 $a10.1007/978-3-658-11388-9 035 $a(CKB)3710000000571734 035 $a(EBL)4322661 035 $a(SSID)ssj0001607102 035 $a(PQKBManifestationID)16315236 035 $a(PQKBTitleCode)TC0001607102 035 $a(PQKBWorkID)14895415 035 $a(PQKB)10801296 035 $a(DE-He213)978-3-658-11388-9 035 $a(MiAaPQ)EBC4322661 035 $a(PPN)191702080 035 $a(EXLCZ)993710000000571734 100 $a20160107d2015 u| 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aTemperature Measurement during Millisecond Annealing $eRipple Pyrometry for Flash Lamp Annealers /$fby Denise Reichel 205 $a1st ed. 2015. 210 1$aWiesbaden :$cSpringer Fachmedien Wiesbaden :$cImprint: Springer,$d2015. 215 $a1 online resource (128 p.) 225 1 $aMatWerk,$x2522-0756 300 $aDescription based upon print version of record. 311 $a3-658-11387-1 320 $aIncludes bibliographical references. 327 $aIntroduction and motivation.- Fundamentals of flash lamp annealing of shallow Boron-doped Silicon.- Fundamentals of surface temperature measurements during flash lamp annealing -- Concept of ripple pyrometry during  flash lamp annealing --  Ripple pyrometry for flash lamp annealing.- Experiments ? ripple pyrometry during flash lamp annealing.- Closing discussion and outlook. 330 $aDenise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the method?s suitability for background-corrected temperature measurement. The experimental results finally proof its power for elevated temperatures. Contents Fundamentals of flash lamp annealing of shallow Boron-doped Silicon Fundamentals of surface temperature measurements during flash lamp annealing Concept of ripple pyrometry during flash lamp annealing      Ripple pyrometry for flash lamp annealing ? Experiments Target Groups ·Researchers and students from the fields of materials sciences and physics ·Practitioners from microelectronics and photovoltaics industry About the Author Dr. Denise Reichel currently works in technical sales and consulting for temperature  measurement needs and as a lecturer for thermodynamics and heat and mass transfer.  . 410 0$aMatWerk,$x2522-0756 606 $aSolid state physics 606 $aThermodynamics 606 $aEngineering?Materials 606 $aSolid State Physics$3https://scigraph.springernature.com/ontologies/product-market-codes/P25013 606 $aThermodynamics$3https://scigraph.springernature.com/ontologies/product-market-codes/P21050 606 $aMaterials Engineering$3https://scigraph.springernature.com/ontologies/product-market-codes/T28000 615 0$aSolid state physics. 615 0$aThermodynamics. 615 0$aEngineering?Materials. 615 14$aSolid State Physics. 615 24$aThermodynamics. 615 24$aMaterials Engineering. 676 $a530 700 $aReichel$b Denise$4aut$4http://id.loc.gov/vocabulary/relators/aut$0837193 906 $aBOOK 912 $a9910298459203321 996 $aTemperature Measurement during Millisecond Annealing$92537540 997 $aUNINA