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010   $a3-319-20385-1
024 7 $a10.1007/978-3-319-20385-0
035   $a(CKB)3710000000498860
035   $a(EBL)4068069
035   $a(SSID)ssj0001584591
035   $a(PQKBManifestationID)16265383
035   $a(PQKBTitleCode)TC0001584591
035   $a(PQKBWorkID)14864790
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035   $a(DE-He213)978-3-319-20385-0
035   $a(MiAaPQ)EBC4068069
035   $a(PPN)190517913
035   $a(EXLCZ)993710000000498860
100   $a20151028d2016      u|         0
101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 10$aDesign for Manufacturability with Advanced Lithography /$fby Bei Yu, David Z. Pan
205   $a1st ed. 2016.
210  1$aCham :$cSpringer International Publishing :$cImprint: Springer,$d2016.
215   $a1 online resource (173 p.)
300   $aDescription based upon print version of record.
311   $a3-319-20384-3 
320   $aIncludes bibliographical references at the end of each chapters and index.
327   $aIntroduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-.
330   $aThis book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.  Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.
606   $aElectronic circuits
606   $aMicroprocessors
606   $aElectronics
606   $aMicroelectronics
606   $aCircuits and Systems$3https://scigraph.springernature.com/ontologies/product-market-codes/T24068
606   $aProcessor Architectures$3https://scigraph.springernature.com/ontologies/product-market-codes/I13014
606   $aElectronics and Microelectronics, Instrumentation$3https://scigraph.springernature.com/ontologies/product-market-codes/T24027
615  0$aElectronic circuits.
615  0$aMicroprocessors.
615  0$aElectronics.
615  0$aMicroelectronics.
615 14$aCircuits and Systems.
615 24$aProcessor Architectures.
615 24$aElectronics and Microelectronics, Instrumentation.
676   $a620
700   $aYu$b Bei$4aut$4http://id.loc.gov/vocabulary/relators/aut$0788068
702   $aPan$b David Z$4aut$4http://id.loc.gov/vocabulary/relators/aut
906   $aBOOK
912   $a9910254227003321
996   $aDesign for Manufacturability with Advanced Lithography$92534937
997   $aUNINA