LEADER 01438nam 2200373 450 001 9910172650803321 005 20230418224341.0 010 $a1-5090-2024-1 035 $a(CKB)3710000001361610 035 $a(NjHacI)993710000001361610 035 $a(EXLCZ)993710000001361610 100 $a20230418d2016 uy 0 101 0 $aeng 135 $aur||||||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$a2016 21st International Conference on Ion Implantation Technology (IIT) /$fInstitute of Electrical and Electronics Engineers 210 1$aPiscataway, NJ :$cIEEE,$d2016. 210 4$dİ2016 215 $a1 online resource (87 pages) 311 $a1-5090-2025-X 320 $aIncludes bibliographical references and index. 330 $aAnnotation The conference will cover topics on ion implantation technology and thermal processing for semiconductor devices and materials including junction, contact, material modification, process modeling and metrology methods. 517 $a2016 21st International Conference on Ion Implantation Technology 606 $aIon implantation$vCongresses 615 0$aIon implantation 676 $a621.38152 801 0$bNjHacI 801 1$bNjHacl 906 $aPROCEEDING 912 $a9910172650803321 996 $a2016 21st International Conference on Ion Implantation Technology (IIT)$92541618 997 $aUNINA