LEADER 02192oam 2200553zu 450 001 996212593703316 005 20210807003355.0 035 $a(CKB)111026746722772 035 $a(SSID)ssj0000395085 035 $a(PQKBManifestationID)12154915 035 $a(PQKBTitleCode)TC0000395085 035 $a(PQKBWorkID)10449853 035 $a(PQKB)10646649 035 $a(EXLCZ)99111026746722772 100 $a20160829d1998 uy 101 0 $aeng 181 $ctxt 182 $cc 183 $acr 200 10$a1998 Fourth International High Temperature Electronics Conference : HITEC, Albuquerque, New Mexico, USA, June 14-18, 1998 210 31$a[Place of publication not identified]$cThe Institute of Electrical and Electronics Engineers Inc$d1998 300 $aBibliographic Level Mode of Issuance: Monograph 311 $a0-7803-4540-1 606 $aElectronics$xMaterials$xCongresses 606 $aHeat resistant materials$vCongresses 606 $aSilicon-on-insulator technology$xCongresses 606 $aField-effect transistors$xCongresses 606 $aGallium arsenide$xCongresses 606 $aElectrical & Computer Engineering$2HILCC 606 $aEngineering & Applied Sciences$2HILCC 606 $aElectrical Engineering$2HILCC 615 0$aElectronics$xMaterials$xCongresses 615 0$aHeat resistant materials 615 0$aSilicon-on-insulator technology$xCongresses 615 0$aField-effect transistors$xCongresses 615 0$aGallium arsenide$xCongresses 615 7$aElectrical & Computer Engineering 615 7$aEngineering & Applied Sciences 615 7$aElectrical Engineering 676 $a621.381/04 712 02$aAir Force Research Laboratory (Wright-Patterson Air Force Base, Ohio) 712 02$aIEEE Electron Devices Society 712 02$aComponents, Packaging & Manufacturing Technology Society 712 12$aInternational High Temperature Electronics Conference 801 0$bPQKB 906 $aPROCEEDING 912 $a996212593703316 996 $a1998 Fourth International High Temperature Electronics Conference : HITEC, Albuquerque, New Mexico, USA, June 14-18, 1998$92507918 997 $aUNISA LEADER 02439oas 2200937 a 450 001 9910146844403321 005 20251105213014.0 011 $a1432-1866 035 $a(DE-599)ZDB1462046-7 035 $a(DE-599)1462046-7 035 $a(OCoLC)39979737 035 $a(CONSER) 2001229248 035 $a(CKB)954925425185 035 $a(EXLCZ)99954925425185 100 $a19981002a19669999 sy a 101 0 $aeng 135 $aurmnu|||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aMineralium deposita 210 $aBerlin ;$aNew York $cSpringer-Verlag 300 $aRefereed/Peer-reviewed 300 $a"International journal for geology, mineralogy, and geochemistry of mineral deposits." 300 $aTitle from journal information screen (viewed Dec. 22, 2001). 311 08$a0026-4598 531 0 $aMiner. depos. 606 $aMineralogy$vPeriodicals 606 $aOre deposits$vPeriodicals 606 $aMine?ralogie$vPe?riodiques 606 $aGi?tes mine?raux$vPe?riodiques 606 $aMineralogy$2fast$3(OCoLC)fst01022406 606 $aOre deposits$2fast$3(OCoLC)fst01047477 606 $aMineralogie$2gtt 606 $aSedimentologia$2thub 606 $aMineralogia$2thub 608 $aPeriodicals.$2fast 608 $aRevistes electròniques.$2thub 615 0$aMineralogy 615 0$aOre deposits 615 6$aMine?ralogie 615 6$aGi?tes mine?raux 615 7$aMineralogy. 615 7$aOre deposits. 615 17$aMineralogie. 615 7$aSedimentologia. 615 7$aMineralogia. 676 $a553.05 712 02$aSpringer-Verlag New York Inc. 712 02$aSociety for Geology Applied to Mineral Deposits 801 0$bPIT 801 1$bPIT 801 2$bOCL 801 2$bFUG 801 2$bOCLCQ 801 2$bMUQ 801 2$bOCL 801 2$bOCLCQ 801 2$bUKMGB 801 2$bOCLCQ 801 2$bOCLCO 801 2$bOCLCF 801 2$bOCLCO 801 2$bOCLCQ 801 2$bCGU 801 2$bVT2 801 2$bNJT 801 2$bDLC 801 2$bOCLCO 801 2$bOCLCQ 801 2$bUAB 801 2$bSXB 801 2$bOCLCL 801 2$bCNTRU 801 2$bCCO 801 2$bFIE 801 2$bOCLCQ 906 $aJOURNAL 912 $a9910146844403321 996 $aMineralium deposita$9792073 997 $aUNINA