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181   $ctxt
182   $cc
183   $acr
200 10$aExtended Abstracts - 2008 8th International Workshop on Junction Technology $e15-16 May 2008, Shanghai, China /$fInstitute of Electrical and Electronics Engineers
210  1$aPiscataway, New Jersey :$cInstitute of Electrical and Electronics Engineers,$d2008.
215   $a1 online resource (77 pages)
300   $aBibliographic Level Mode of Issuance: Monograph
311   $a1-4244-1737-6 
606   $aSemiconductors$xJunctions$vCongresses
606   $aSemiconductors$xDesign and construction$vCongresses
606   $aIntegrated circuits$xVery large scale integration$xDesign and construction$vCongresses
615  0$aSemiconductors$xJunctions
615  0$aSemiconductors$xDesign and construction
615  0$aIntegrated circuits$xVery large scale integration$xDesign and construction
676   $a621.38152
712 02$aInstitute of Electrical and Electronics Engineers,
801  0$bWaSeSS
801  1$bWaSeSS
906   $aPROCEEDING
912   $a9910145710303321
996   $aExtended Abstracts - 2008 8th International Workshop on Junction Technology$92502838
997   $aUNINA