LEADER 05080nam 2200625 450 001 9910144714203321 005 20170816124509.0 010 $a1-281-84263-X 010 $a9786611842635 010 $a3-527-61481-8 010 $a3-527-61480-X 035 $a(CKB)1000000000377544 035 $a(EBL)482089 035 $a(OCoLC)609728788 035 $a(SSID)ssj0000134232 035 $a(PQKBManifestationID)11162600 035 $a(PQKBTitleCode)TC0000134232 035 $a(PQKBWorkID)10055548 035 $a(PQKB)11687136 035 $a(MiAaPQ)EBC482089 035 $a(EXLCZ)991000000000377544 100 $a20160819h19961996 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aCVD of nonmetals /$fedited by William S. Rees, Jr 210 1$aWeinheim, [Germany] :$cVCH,$d1996. 210 4$dİ1996 215 $a1 online resource (449 p.) 300 $aDescription based upon print version of record. 311 $a3-527-29295-0 327 $aCVD of Nonmetals; Contents; 1 . Introduction; 1.1 Organization of the Book; 1.1.1 Scope of the Book; 1.1.2 Potential Audience; 1.1.3 Selection of Chapter Topics; 1.1.4 Chapter Organization; 1.1.4.1 Cross-References Between Chapters; 1.1.4.2 Where to Find a Topic; 1.2 Uses of Materials; 1.2.1 Electronic Applications; 1.2.1.1 Band Gap Classifications; 1.2.2 Optical Applications; 1.2.3 Structural Applications; 1.3 Comparison of Deposition Techniques; 1.3.1 Comparison of Chemical Vapor Deposition Sub-Techniques; 1.3.1.1 Organometallic Vapor Phase Epitaxy (OMVPE); 1.3.1.2 PlasmaCVD 327 $a1.3.1.3 PhotoCVD1.3.1.4 Pressure Modifications in CVD; 1.3.1.5 Spray Pyrolysis Modifications; 1.3.2 Comparison of Non-Chemical Vapor Deposition Technologies; 1.3.2.1 Molecular Beam Epitaxy (MBE); 1.3.2.2 Other Physical Vapor Deposition Techniques; 1.4 General Comments on CVD; 1.4.1 Reactor Types; 1.4.2 Important Reaction Locations in CVD Reactors; 1.5 Experimental Design; 1.5.1 System Configuration; 1.5.1.1 System Reactant Input; 1.5.1.2 Reaction Zones; 1.5.1.3 Reaction Co-Product Removal System; 1.5.2 Handling of Precursors; 1.5.3 Methods of Energy Input; 1.5.3.1 Thermal CVD 327 $a1.5.3.2 Alternate Modes1.5.4 Vapor Analysis in CVD; 1.6 Reaction Kinetics in CVD; 1.6.1 General Comments; 1.6.2 Vapor Phase Reactions; 1.6.3 Vapor-Solid Phase Reactions; 1.6.4 Solid Phase Reactions; 1.6.5 Control of Reaction Location; 1.6.6 Rate-Determining Steps in CVD; 1.6.7 Temperature and Growth Rate Effects; 1.7 Thermodynamics in CVD; 1.8 General Comments on Precursors; 1.8.1 Design Considerations; 1.8.2 Structural Motifs; 1.8.3 Mechanistic Insights; 1.9 References; 2 . Superconducting Materials; 2.1 Introduction; 2.2 Overview of Superconductivity 327 $a2.2.1 Physical Properties of Superconductors2.2.2 Low Temperature Superconducting Materials; 2.2.2.1 Crystal Structures of LTS Materials; 2.2.3 High Temperature Superconducting Materials; 2.2.3.1 Crystal Structure of HTS Materials; 2.2.4 Applications of Superconductors; 2.2.4.1 Large-Scale Applications of Superconducting Magnets; 2.2.4.2 Low-Field Applications of Superconductors; 2.2.4.3 Superconducting Electronics Applications; 2.3 CVD of LTS Materials; 2.3.1 Nb3Sn CVD Film Growth; 2.3.1.1 Nb3Sn CVD Precursors and Reaction Schemes; 2.3.1.2 Nb3Sn CVD Reactor Design 327 $a2.3.1.3 Substrates for Nb3Sn CVD2.3.1.4 Physical Properties of CVD-Derived Nb3Sn Films; 2.3.2 Nb3Ge CVD Film Growth; 2.3.2.1 Nb3Ge CVD Precursors and Reaction Schemes; 2.3.2.2 Nb3Ge CVD Reactor Design; 2.3.2.3 Physical Properties of CVD-Derived Nb3Ge Films; 2.3.2.4 Films Effects of Chemical Doping Upon Physical Properties of CVD-Derived Nb3Ge; 2.3.3 NbC1-y Ny CVD Film Growth; 2.3.3.1 NbC1-yNy CVD Precursors and Reaction Schemes; 2.3.3.2 Reactor Design for CVD of NbC1-y Ny on Carbon Fiber; 2.3.3.3 Physical Properties of CVD-Derived NbCI, Ny Films; 2.3.4 NbN CVD Film Growth 327 $a2.3.4.1 NbN CVD Precursors and Reaction Schemes 330 $aWritten by leading experts in the field, this practical reference handbook offers an up-to-date, critical survey of the chemical vapor deposition (CVD) of nonmetals, a key technology in semiconductor electronics, finishing, and corrosion protection.The basics necessary for any CVD process are discussed in the introduction. In the following chapters, precursor requirements, with an emphasis on materials chemistry, common structures of reactants and substrates, as well as reaction control are discussed for a broad range of compositions including superconducting, conducting, semiconductin 606 $aChemical vapor deposition 606 $aNonmetals 608 $aElectronic books. 615 0$aChemical vapor deposition. 615 0$aNonmetals. 676 $a620.44 676 $a671.735 702 $aRees$b William S. 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910144714203321 996 $aCVD of nonmetals$92245923 997 $aUNINA LEADER 02049oas 2200757 a 450 001 9910142320703321 005 20260310213014.0 011 $a2332-581X 035 $a(DE-599)ZDB2778432-0 035 $a(DE-599)2778432-0 035 $a(OCoLC)70220248 035 $a(CONSER) 2006213989 035 $a(CKB)1000000000312727 035 $a(EXLCZ)991000000000312727 100 $a20060630a20069999 sy a 101 0 $aeng 135 $aurcnu|||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 00$aAfrica policy journal 210 $aCambridge, MA $cJohn F. 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