LEADER 05080nam 2200625 450 001 9910144714203321 005 20170816124509.0 010 $a1-281-84263-X 010 $a9786611842635 010 $a3-527-61481-8 010 $a3-527-61480-X 035 $a(CKB)1000000000377544 035 $a(EBL)482089 035 $a(OCoLC)609728788 035 $a(SSID)ssj0000134232 035 $a(PQKBManifestationID)11162600 035 $a(PQKBTitleCode)TC0000134232 035 $a(PQKBWorkID)10055548 035 $a(PQKB)11687136 035 $a(MiAaPQ)EBC482089 035 $a(EXLCZ)991000000000377544 100 $a20160819h19961996 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aCVD of nonmetals /$fedited by William S. Rees, Jr 210 1$aWeinheim, [Germany] :$cVCH,$d1996. 210 4$dİ1996 215 $a1 online resource (449 p.) 300 $aDescription based upon print version of record. 311 $a3-527-29295-0 327 $aCVD of Nonmetals; Contents; 1 . Introduction; 1.1 Organization of the Book; 1.1.1 Scope of the Book; 1.1.2 Potential Audience; 1.1.3 Selection of Chapter Topics; 1.1.4 Chapter Organization; 1.1.4.1 Cross-References Between Chapters; 1.1.4.2 Where to Find a Topic; 1.2 Uses of Materials; 1.2.1 Electronic Applications; 1.2.1.1 Band Gap Classifications; 1.2.2 Optical Applications; 1.2.3 Structural Applications; 1.3 Comparison of Deposition Techniques; 1.3.1 Comparison of Chemical Vapor Deposition Sub-Techniques; 1.3.1.1 Organometallic Vapor Phase Epitaxy (OMVPE); 1.3.1.2 PlasmaCVD 327 $a1.3.1.3 PhotoCVD1.3.1.4 Pressure Modifications in CVD; 1.3.1.5 Spray Pyrolysis Modifications; 1.3.2 Comparison of Non-Chemical Vapor Deposition Technologies; 1.3.2.1 Molecular Beam Epitaxy (MBE); 1.3.2.2 Other Physical Vapor Deposition Techniques; 1.4 General Comments on CVD; 1.4.1 Reactor Types; 1.4.2 Important Reaction Locations in CVD Reactors; 1.5 Experimental Design; 1.5.1 System Configuration; 1.5.1.1 System Reactant Input; 1.5.1.2 Reaction Zones; 1.5.1.3 Reaction Co-Product Removal System; 1.5.2 Handling of Precursors; 1.5.3 Methods of Energy Input; 1.5.3.1 Thermal CVD 327 $a1.5.3.2 Alternate Modes1.5.4 Vapor Analysis in CVD; 1.6 Reaction Kinetics in CVD; 1.6.1 General Comments; 1.6.2 Vapor Phase Reactions; 1.6.3 Vapor-Solid Phase Reactions; 1.6.4 Solid Phase Reactions; 1.6.5 Control of Reaction Location; 1.6.6 Rate-Determining Steps in CVD; 1.6.7 Temperature and Growth Rate Effects; 1.7 Thermodynamics in CVD; 1.8 General Comments on Precursors; 1.8.1 Design Considerations; 1.8.2 Structural Motifs; 1.8.3 Mechanistic Insights; 1.9 References; 2 . Superconducting Materials; 2.1 Introduction; 2.2 Overview of Superconductivity 327 $a2.2.1 Physical Properties of Superconductors2.2.2 Low Temperature Superconducting Materials; 2.2.2.1 Crystal Structures of LTS Materials; 2.2.3 High Temperature Superconducting Materials; 2.2.3.1 Crystal Structure of HTS Materials; 2.2.4 Applications of Superconductors; 2.2.4.1 Large-Scale Applications of Superconducting Magnets; 2.2.4.2 Low-Field Applications of Superconductors; 2.2.4.3 Superconducting Electronics Applications; 2.3 CVD of LTS Materials; 2.3.1 Nb3Sn CVD Film Growth; 2.3.1.1 Nb3Sn CVD Precursors and Reaction Schemes; 2.3.1.2 Nb3Sn CVD Reactor Design 327 $a2.3.1.3 Substrates for Nb3Sn CVD2.3.1.4 Physical Properties of CVD-Derived Nb3Sn Films; 2.3.2 Nb3Ge CVD Film Growth; 2.3.2.1 Nb3Ge CVD Precursors and Reaction Schemes; 2.3.2.2 Nb3Ge CVD Reactor Design; 2.3.2.3 Physical Properties of CVD-Derived Nb3Ge Films; 2.3.2.4 Films Effects of Chemical Doping Upon Physical Properties of CVD-Derived Nb3Ge; 2.3.3 NbC1-y Ny CVD Film Growth; 2.3.3.1 NbC1-yNy CVD Precursors and Reaction Schemes; 2.3.3.2 Reactor Design for CVD of NbC1-y Ny on Carbon Fiber; 2.3.3.3 Physical Properties of CVD-Derived NbCI, Ny Films; 2.3.4 NbN CVD Film Growth 327 $a2.3.4.1 NbN CVD Precursors and Reaction Schemes 330 $aWritten by leading experts in the field, this practical reference handbook offers an up-to-date, critical survey of the chemical vapor deposition (CVD) of nonmetals, a key technology in semiconductor electronics, finishing, and corrosion protection.The basics necessary for any CVD process are discussed in the introduction. In the following chapters, precursor requirements, with an emphasis on materials chemistry, common structures of reactants and substrates, as well as reaction control are discussed for a broad range of compositions including superconducting, conducting, semiconductin 606 $aChemical vapor deposition 606 $aNonmetals 608 $aElectronic books. 615 0$aChemical vapor deposition. 615 0$aNonmetals. 676 $a620.44 676 $a671.735 702 $aRees$b William S. 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910144714203321 996 $aCVD of nonmetals$92245923 997 $aUNINA LEADER 02420oam 2200553M 450 001 9910716495203321 005 20200213070914.9 035 $a(CKB)5470000002521189 035 $a(OCoLC)1065603502 035 $a(OCoLC)995470000002521189 035 $a(EXLCZ)995470000002521189 100 $a20071213d1926 ua 0 101 0 $aeng 135 $aurcn||||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aClaims for damages for collision with lighthouse vessels. Communication from the President of the United States transmitting a communication from the Acting Secretary of Commerce submitting an estimate of appropriation to pay claims for damages to privately owned property in the sum of $ 549.79 ... December 9, 1926. -- Referred to the Committee on Appropriations and ordered to be printed 210 1$a[Washington, D.C.] :$c[U.S. Government Printing Office],$d1926. 215 $a1 online resource (3 pages) 225 1 $aHouse document / 69th Congress, 2nd session. House ;$vno. 568 225 1 $a[United States congressional serial set] ;$v[serial no. 8734] 300 $aBatch processed record: Metadata reviewed, not verified. Some fields updated by batch processes. 300 $aFDLP item number not assigned. 606 $aClaims 606 $aMalicious mischief 606 $aVandalism 606 $aLighthouses 606 $aLightships 606 $aCollisions at sea 608 $aLegislative materials.$2lcgft 615 0$aClaims. 615 0$aMalicious mischief. 615 0$aVandalism. 615 0$aLighthouses. 615 0$aLightships. 615 0$aCollisions at sea. 701 $aCoolidge$b Calvin$f1872-1933.$01386178 712 02$aUnited States.$bPresident (1923-1929 : Coolidge) 712 02$aUnited States.$bDepartment of Commerce. 712 02$aUnited States.$bDepartment of the Treasury.$bBureau of the Budget (1921-1939) 801 0$bWYU 801 1$bWYU 801 2$bOCLCO 801 2$bOCLCQ 906 $aBOOK 912 $a9910716495203321 996 $aClaims for damages for collision with lighthouse vessels. Communication from the President of the United States transmitting a communication from the Acting Secretary of Commerce submitting an estimate of appropriation to pay claims for damages to privately owned property in the sum of$93494296 997 $aUNINA LEADER 01775nam 2200397z- 450 001 9910347052403321 005 20210211 010 $a1000040667 035 $a(CKB)4920000000101992 035 $a(oapen)https://directory.doabooks.org/handle/20.500.12854/40381 035 $a(oapen)doab40381 035 $a(EXLCZ)994920000000101992 100 $a20202102d2014 |y 0 101 0 $aeng 135 $aurmn|---annan 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 00$aAdvancing Electromyographic Continuous Speech Recognition: Signal Preprocessing and Modeling 210 $cKIT Scientific Publishing$d2014 215 $a1 online resource (XVIII, 226 p. p.) 311 08$a3-7315-0211-9 330 $aSpeech is the natural medium of human communication, but audible speech can be overheard by bystanders and excludes speech-disabled people. This work presents a speech recognizer based on surface electromyography, where electric potentials of the facial muscles are captured by surface electrodes, allowing speech to be processed nonacoustically. A system which was state-of-the-art at the beginning of this book is substantially improved in terms of accuracy, flexibility, and robustness. 517 $aAdvancing Electromyographic Continuous Speech Recognition 610 $aBiosignale 610 $aBiosignals 610 $aElectromyography 610 $aElektromyographie 610 $aSilent Speech Interfaces 610 $aSpeech Recognition 610 $aSpracherkennung 700 $aWand$b Michael$4auth$01323454 906 $aBOOK 912 $a9910347052403321 996 $aAdvancing Electromyographic Continuous Speech Recognition: Signal Preprocessing and Modeling$93035573 997 $aUNINA