LEADER 04832nam 2200673Ia 450 001 9910144594603321 005 20180612233939.0 010 $a1-281-08802-1 010 $a9786611088026 010 $a3-527-61155-X 010 $a3-527-61156-8 035 $a(CKB)1000000000376993 035 $a(EBL)481879 035 $a(OCoLC)181369115 035 $a(SSID)ssj0000222464 035 $a(PQKBManifestationID)11910868 035 $a(PQKBTitleCode)TC0000222464 035 $a(PQKBWorkID)10174173 035 $a(PQKB)11074432 035 $a(MiAaPQ)EBC481879 035 $a(PPN)243027893 035 $a(EXLCZ)991000000000376993 100 $a20070926d2007 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aPlasma-aided nanofabrication$b[electronic resource] $efrom plasma sources to nanoassembly /$fKostya (Ken) Ostrikov and Shuyan Xu 210 $aWeinheim $cWiley-VCH$dc2007 215 $a1 online resource (317 p.) 300 $aDescription based upon print version of record. 311 $a3-527-40633-6 320 $aIncludes bibliographical references and index. 327 $aPlasma-Aided Nanofabrication; Contents; Preface; 1 Introduction; 1.1 What is a Plasma?; 1.2 Relevant Issues of Nanoscience and Nanotechnology; 1.3 Plasma-Assisted Synthesis of Nanomaterials; 1.4 How to Choose the Right Plasma for Applications in Nanotechnology?; 1.5 Structure of the Monograph and Advice to the Reader; 2 Generation of Highly Uniform, High-Density Inductively Coupled Plasma; 2.1 Low-Frequency ICP with a Flat External Spiral Coil: Plasma Source and Diagnostic Equipment; 2.1.1 Plasma Source; 2.1.2 Diagnostics of Inductively Coupled Plasmas 327 $a3 Plasma Sources: Meeting the Demands of Nanotechnology3.1 Inductively Coupled Plasma Source with Internal Oscillating Currents: Concept and Experimental Verification; 3.1.1 Configuration of the IOCPS; 3.1.2 RF Power Deposition; 3.1.3 Plasma Parameters; 3.2 IOCPS: Stability and Mode Transitions; 3.2.1 Optical Emission; 3.2.2 Self-Transitions of the IOCPS Discharge Modes; 3.3 ICP-Assisted DC Magnetron Sputtering Device; 3.3.1 Enhancement of DC Magnetron Sputtering by an Inductively Coupled Plasma Source; 3.3.2 Mode Transitions in ICP-Assisted Magnetron Sputtering Device 327 $a3.4 Integrated Plasma-Aided Nanofabrication Facility3.5 Concluding Remarks; 4 Carbon-Based Nanostructures; 4.1 Growth of Carbon Nanostructures on Unheated Substrates; 4.1.1 Process Details; 4.1.2 Synthesis, Characterization, and Growth Kinetics; 4.2 Temperature-Controlled Regime; 4.3 Single-Crystalline Carbon Nanotips: Experiment; 4.4 Single-Crystalline Carbon Nanotips: ab initio Simulations; 4.4.1 Theoretical Background and Numerical Code; 4.4.2 Geometrical Stability of Carbon Nanotip Structures; 4.4.3 Electronic Properties of Carbon Nanotips 327 $a4.5 Plasma-Assisted Doping and Functionalization of Carbon Nanostructures4.5.1 Doping of Carbon-Based Nanostructures: Density Functional Theory Considerations; 4.5.2 Postprocessing of Carbon-Based Nanostructures: Experiments; 4.6 Synthesis of Carbon Nanowall-Like Structures; 5 Quantum Confinement Structures; 5.1 Plasma-Assisted Fabrication of AlN Quantum Dots; 5.2 Nanofabrication of Al(x)In(1-x)N Quantum Dots: Plasma-Aided Bandgap Control; 5.3 Plasma-Aided Nanofabrication of SiC Quantum Dot Arrays; 5.3.1 SiC Properties and Applications; 5.3.2 SiC Growth Modes: With and Without AlN Interlayer 327 $a5.3.3 Quest for Crystallinity and Nanopattern Uniformity 330 $aIn this single work to cover the use of plasma as nanofabrication tool in sufficient depth internationally renowned authors with much experience in this important method of nanofabrication look at reactive plasma as a nanofabrication tool, plasma production and development of plasma sources, as well as such applications as carbon-based nanostructures, low-dimensional quantum confinement structures and hydroxyapatite bioceramics. Written principally for solid state physicists and chemists, materials scientists, and plasma physicists, the book concludes with the outlook for such applications. 606 $aLow temperature plasmas 606 $aManufacturing processes 606 $aNanostructured materials 606 $aPlasma engineering 615 0$aLow temperature plasmas. 615 0$aManufacturing processes. 615 0$aNanostructured materials. 615 0$aPlasma engineering. 676 $a620.5 676 $a621.044 700 $aOstrikov$b K$g(Kostya)$0935724 701 $aXu$b Shuyan$0935725 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910144594603321 996 $aPlasma-aided nanofabrication$92107757 997 $aUNINA