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010   $a9786611764319
010   $a3-527-61680-2
010   $a3-527-61689-6
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035   $a(EBL)481683
035   $a(OCoLC)806201781
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100   $a20750414d1999      uy             0
101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 00$aAdvances in electrochemical science and engineering$hVolume 6$b[electronic resource] /$fedited by Richard C. Alkire and Dieter M. Kolb
210   $aNew York, N.Y. ;$aWeinheim $cWiley$dc1999
215   $a1 online resource (359 p.)
225 1 $aAdvances in electrochemical science and engineering ;$vv. 6
300   $aDescription based upon print version of record.
311   $a3-527-29515-1 
320   $aIncludes bibliographical references and index.
327   $aAdvances in Electrochemical Science and Engineering; Contents; Computer Simulations of Electrochemical Interfaces; Time and Frequency Resolved Studies of Photoelectrochemical Kinetics; Chemical Deposition of Chalcogenide Thin Films from Solutions; Plasma Engineering; Index
330   $aVolume 6 in the well-establish series Advances in Electrochemical Science and Engineering covers - among others - such important topics as time dependent modulation techniques and computer modeling by continuum and non-continuum methods.As in all previous volumes, the editors have succeeded in selecting highly topical areas of electrochemical research and in presenting authors who are leaders in their fields.  The result is a compelling set of reviews which serves equally well as an excellent and up-to-date source of information for experienced researchers active in the field as well a
410  0$aAdvances in electrochemical science and engineering ;$vv. 6.
606   $aElectrochemistry
606   $aChemistry, Physical and theoretical
608   $aElectronic books.
615  0$aElectrochemistry.
615  0$aChemistry, Physical and theoretical.
676   $a541.3/7
676   $a541.37
701   $aAlkire$b R. C.$f1941-$0884240
701   $aKolb$b Dieter M$0884241
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910144133103321
996   $aAdvances in electrochemical science and engineering$91974516
997   $aUNINA