LEADER 03780nam 2200601 a 450 001 9910143706103321 005 20170809164651.0 010 $a1-282-34620-2 010 $a9786612346200 010 $a0-470-01794-5 010 $a0-470-06541-9 035 $a(CKB)1000000000357405 035 $a(EBL)290997 035 $a(OCoLC)476048340 035 $a(SSID)ssj0000138763 035 $a(PQKBManifestationID)11158392 035 $a(PQKBTitleCode)TC0000138763 035 $a(PQKBWorkID)10100704 035 $a(PQKB)11779710 035 $a(MiAaPQ)EBC290997 035 $a(PPN)175354006 035 $a(EXLCZ)991000000000357405 100 $a20060918d2007 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aDielectric films for advanced microelectronics$b[electronic resource] /$fedited by Mikhail Baklanov, Martin Green, and Karen Maex 210 $aChichester, England ;$aHoboken, NJ $cJohn Wiley & Sons$dc2007 215 $a1 online resource (510 p.) 225 1 $aWiley series in materials for electronic and optoelectronic applications 300 $aDescription based upon print version of record. 311 $a0-470-01360-5 320 $aIncludes bibliographical references and index. 327 $tLow and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition /$rA. Grill --$tSpin-on dielectric materials /$rGeraud Dubois, Robert D. Miller, Willi Volksen --$tPositron annihilation spectroscopy /$rDavid W. Gidley, Hua-Gen Peng, Richard Vallery --$tStructure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation /$rChristopher L. Soles ... [et al.] --$tEllipsometric porosimetry /$rMikhail R. Baklanov --$tMechanical and transport properties of low-k dielectrics /$rJ. L. Plawsky ... [et al.] --$tIntegration of low-k dielectric films in damascene processes /$rR. J. O. M. Hoofman ... [et al.] --$tONO structures and oxynitrides in modern microelectronics : material science, characterization and application /$rYakov Roizin, Vladimir Gritsenko --$tMaterial engineering of high-k gate dielectrics /$rAkira Toriumi, Koji Kita --$tPhysical characterization of ultra-thin high-k dielectric /$rT. Conard, H. Bender, W. Vandervorst --$tElectrical characterization of advanced gate dielectrics /$rRobin Degraeve ... [et al.] --$tIntegration issues of high-k gate dielectrics /$rYasuo Nara --$tAnisotropic conductive film (ACF) for advanced microelectronic interconnects /$rYi Li, C. P. Wong. 330 $aThe topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments mad 410 0$aWiley series in materials for electronic and optoelectronic applications. 606 $aDielectric films 606 $aMicroelectronics$xMaterials 615 0$aDielectric films. 615 0$aMicroelectronics$xMaterials. 676 $a621.381 701 $aBaklanov$b Mikhail$0895636 701 $aGreen$b Martin$0151860 701 $aMaex$b Karen$0895637 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910143706103321 996 $aDielectric films for advanced microelectronics$92000770 997 $aUNINA LEADER 03046nam 22006015 450 001 9910484866903321 005 20250610110247.0 010 $a9783030660536 010 $a3030660532 024 7 $a10.1007/978-3-030-66053-6 035 $a(CKB)4100000011781620 035 $a(MiAaPQ)EBC6508433 035 $a(Au-PeEL)EBL6508433 035 $a(OCoLC)1241448883 035 $a(DE-He213)978-3-030-66053-6 035 $a(MiAaPQ)EBC29090365 035 $a(EXLCZ)994100000011781620 100 $a20210223d2021 u| 0 101 0 $aeng 135 $aurcnu|||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aSystemic Cycle and Institutional Change $eLabor Markets in the USA, Germany and China /$fby Josip Lu?ev 205 $a1st ed. 2021. 210 1$aCham :$cSpringer International Publishing :$cImprint: Palgrave Macmillan,$d2021. 215 $a1 online resource (332 pages) 311 08$a9783030660529 311 08$a3030660524 327 $a1. World-systems analysis and the systemic cycle -- 2. Institutions and institutional change -- 3. Framework oriented interpretations of the systemic cycle and institutional theory -- 4. A Systemic Cycle Oriented Framework of Institutional Change -- 5. Labor Market in United States of America -- 6. Labor Market in Germany -- 7. Labor Market in PR China -- 8. The Three Cases and their Patterns -- 9. Conclusions. 330 $aThis book explores endogenous institutional change and the global, cyclical, and power-based drivers that underpin it. A metatheoretical framework is presented to highlight the influence of path dependence, systemic cycle driven power relations, and institutional design on the development of labor institutions. The framework is applied to the USA, Germany, and China to provide a comparative economic perspective. Systemic Cycle and Institutional Change: Labor Markets in the USA, Germany and China aims to examine endogenous institutional change through analyzing the systemic cycle and bringing together global and national conceptions of capitalism. It is relevant to students and researchers interested in comparative economics, political economy, and labor economics. Josip Lu?ev is a political scientist at Faculty of Political Science, University of Zagreb. 606 $aLabor economics 606 $aEconomics 606 $aDevelopment economics 606 $aLabor Economics 606 $aPolitical Economy and Economic Systems 606 $aDevelopment Economics 615 0$aLabor economics. 615 0$aEconomics. 615 0$aDevelopment economics. 615 14$aLabor Economics. 615 24$aPolitical Economy and Economic Systems. 615 24$aDevelopment Economics. 676 $a331.1 676 $a331.12 700 $aLucev$b Josip$0850053 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910484866903321 996 $aSystemic cycle and institutional change$91898214 997 $aUNINA