LEADER 04753nam 2200709Ia 450 001 9910140811003321 005 20200520144314.0 010 $a1-118-04357-X 010 $a1-282-75596-X 010 $a9786612755965 010 $a0-470-61894-9 010 $a0-470-61893-0 035 $a(CKB)2670000000034608 035 $a(EBL)588875 035 $a(SSID)ssj0000414604 035 $a(PQKBManifestationID)11285006 035 $a(PQKBTitleCode)TC0000414604 035 $a(PQKBWorkID)10395787 035 $a(PQKB)10194913 035 $a(Au-PeEL)EBL588875 035 $a(CaPaEBR)ebr10419114 035 $a(CaONFJC)MIL275596 035 $a(CaSebORM)9781118043578 035 $a(MiAaPQ)EBC588875 035 $a(OCoLC)689995793 035 $a(EXLCZ)992670000000034608 100 $a20091215d2010 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aComputational lithography$b[electronic resource] /$fXu Ma and Gonzalo R. Arce 205 $a1st edition 210 $aOxford $cWiley-Blackwell$d2010 215 $a1 online resource (244 p.) 225 1 $aWiley series in pure and applied optics 300 $aDescription based upon print version of record. 311 $a0-470-59697-X 320 $aIncludes bibliographical references and index. 330 $aA Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLABŪ software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLABŪ software guide is also included. An accompanying MATLABŪ software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography . Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers ... 410 0$aWiley series in pure and applied optics. 606 $aMicrolithography$xMathematics 606 $aIntegrated circuits$xDesign and construction$xMathematics 606 $aPhotolithography$xMathematics 606 $aSemiconductors$xEtching$xMathematics 606 $aResolution (Optics) 615 0$aMicrolithography$xMathematics. 615 0$aIntegrated circuits$xDesign and construction$xMathematics. 615 0$aPhotolithography$xMathematics. 615 0$aSemiconductors$xEtching$xMathematics. 615 0$aResolution (Optics) 676 $a621.381531 700 $aMa$b Xu$f1983-$0970003 701 $aArce$b Gonzalo R$0970004 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910140811003321 996 $aComputational lithography$92204898 997 $aUNINA