LEADER 05933nam 2200673Ia 450 001 9910139552903321 005 20240912155833.0 010 $a1-283-33247-7 010 $a9786613332479 010 $a1-118-16290-0 010 $a1-118-16289-7 010 $a1-118-16292-7 035 $a(CKB)2550000000064893 035 $a(EBL)818502 035 $a(SSID)ssj0000542804 035 $a(PQKBManifestationID)11336198 035 $a(PQKBTitleCode)TC0000542804 035 $a(PQKBWorkID)10511751 035 $a(PQKB)10553135 035 $a(Au-PeEL)EBL818502 035 $a(CaPaEBR)ebr10510572 035 $a(CaONFJC)MIL333247 035 $a(PPN)16882051X 035 $a(OCoLC)768204537 035 $a(MiAaPQ)EBC818502 035 $a(MiAaPQ)EBC4032427 035 $a(EXLCZ)992550000000064893 100 $a20110811d2012 uy 0 101 0 $aeng 135 $aurcn||||||||| 181 $ctxt 182 $cc 183 $acr 200 10$aX-ray photoelectron spectroscopy $ean introduction to principles and practices /$fPaul van der Heide 210 $aHoboken, N.J. $cWiley$dc2012 215 $a1 online resource (262 p.) 311 $a1-118-06253-1 320 $aIncludes bibliographical references and index. 327 $aX-RAY PHOTOELECTRON SPECTROSCOPY: An Introduction to Principles and Practices; CONTENTS; FOREWORD; PREFACE; ACKNOWLEDGMENTS; LIST OF CONSTANTS; CHAPTER 1: INTRODUCTION; 1.1 SURFACE ANALYSIS; 1.2 XPS/ESCA FOR SURFACE ANALYSIS; 1.3 HISTORICAL PERSPECTIVE; 1.4 PHYSICAL BASIS OF XPS; 1.5 SENSITIVITY AND SPECIFICITY OF XPS; 1.6 SUMMARY; CHAPTER 2: ATOMS, IONS, AND THEIR ELECTRONIC STRUCTURE; 2.1 ATOMS, IONS, AND MATTER; 2.1.1 Atomic Structure; 2.1.2 Electronic Structure; 2.1.2.1 Quantum Numbers; 2.1.2.2 Stationary-State Notation; 2.1.2.3 Stationary-State Transition Notation 327 $a2.1.2.4 Stationary States 2.1.2.5 Spin Orbit Splitting; 2.2 SUMMARY; CHAPTER 3: XPS INSTRUMENTATION; 3.1 PREREQUISITES OF X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); 3.1.1 Vacuum; 3.1.1.1 Vacuum Systems; 3.1.2 X-ray Sources; 3.1.2.1 Standard Sources; 3.1.2.2 Monochromated Sources; 3.1.2.3 Gas Discharge Lamps; 3.1.2.4 Synchrotron Sources; 3.1.3 Electron Sources; 3.1.3.1 Thermionic Sources; 3.1.4 Ion Sources; 3.1.4.1 EI Sources; 3.1.5 Energy Analyzers; 3.1.5.1 CMA; 3.1.5.2 CHA; 3.1.5.3 Modes of Operation; 3.1.5.4 Energy Resolution; 3.1.6 Detectors; 3.1.6.1 EMs; 3.1.7 Imaging; 3.1.7.1 Serial Imaging 327 $a3.1.7.2 Parallel Imaging 3.1.7.3 Spatial Resolution; 3.2 SUMMARY; CHAPTER 4: DATA COLLECTION AND QUANTIFICATION; 4.1 ANALYSIS PROCEDURES; 4.1.1 Sample Handling; 4.1.2 Data Collection; 4.1.3 Energy Referencing; 4.1.4 Charge Compensation; 4.1.5 X-ray and Electron-Induced Damage; 4.2 PHOTOELECTRON INTENSITIES; 4.2.1 Photoelectron Cross Sections; 4.2.2 The Analyzed Volume; 4.2.2.1 Electron Path Lengths; 4.2.2.2 Takeoff Angle; 4.2.3 The Background Signal; 4.2.4 Quantification; 4.3 INFORMATION AS A FUNCTION OF DEPTH; 4.3.1 Opening up the Third Dimension; 4.3.1.1 AR-XPS and Energy-Resolved XPS 327 $a4.3.1.2 Sputter Depth Profiling 4.4 SUMMARY; CHAPTER 5: SPECTRAL INTERPRETATION; 5.1 SPECIATION; 5.1.1 Photoelectron Binding Energies; 5.1.1.1 The Z + 1 Approximation; 5.1.1.2 Initial State Effects; 5.1.1.3 Final State Effects; 5.1.1.4 The Auger Parameter; 5.1.1.5 Curve Fitting; 5.2 SUMMARY; CHAPTER 6: SOME CASE STUDIES; 6.1 OVERVIEW; 6.1.1 Iodine Impregnation of Single-Walled Carbon Nanotube (SWNT); 6.1.2 Analysis of Group IIA-IV Metal Oxides; 6.1.3 Analysis of Mixed Metal Oxides of Interest as SOFC Cathodes; 6.1.4 Analysis of YBCO and Related Oxides/Carbonates; 6.2 SUMMARY; APPENDICES 327 $aAPPENDIX A: PERIODIC TABLE OF THE ELEMENTS APPENDIX B: BINDING ENERGIES (B.E.XPS ORB.E.XRF) OF THE ELEMENTS; B.1 1S-3S, 2P-3P, AND 3D VALUES; B.2 4S-5S, 4P-5P, AND 4D VALUES; APPENDIX C: SOME QUANTUM MECHANICS CALCULATIONS OF INTEREST; APPENDIX D: SOME STATISTICAL DISTRIBUTIONS OF INTEREST; D.1 GAUSSIAN DISTRIBUTION; D.2 POISSON DISTRIBUTION; D.3 LORENTZIAN DISTRIBUTIONS; APPENDIX E: SOME OPTICAL PROPERTIES OF INTEREST; E.1 CHROMATIC ABERRATIONS; E.2 SPHERICAL ABERRATIONS; E.3 DIFFRACTION LIMIT; APPENDIX F: SOME OTHER SPECTROSCOPIC/SPECTROMETRIC TECHNIQUES OF INTEREST 327 $aF.1 PHOTON SPECTROSCOPIES 330 $a"This book introduces readers interested in the field of X-ray Photoelectron Spectroscopy (XPS) to the practical concepts in this field. The book first introduces the reader to the language and concepts used in this field and then demonstrates how these concepts are applied. Including how the spectra are produced, factors that can influence the spectra (all initial and final state effects are discussed), how to derive speciation, volume analysed and how one controls this (includes depth profiling), and quantification along with background substraction and curve fitting methodologies. This is presented in a concise yet comprehensive manner and each section is prepared such that they can be read independently of each other, and all equations are presented using the most commonly used units. Greater emphasis has been placed on spectral understanding/interpretation. For completeness sake, a description of commonly used instrumentation is also presented. Finally, some complementary surface analytical techniques and associated concepts are reviewed for comparative purposes in stand-alone appendix sections"--$cProvided by publisher. 606 $aX-ray photoelectron spectroscopy 606 $aSpectrum analysis 615 0$aX-ray photoelectron spectroscopy. 615 0$aSpectrum analysis. 676 $a543/.62 686 $aSCI078000$2bisacsh 700 $aVan der Heide$b Paul$f1962-$0900477 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910139552903321 996 $aX-ray photoelectron spectroscopy$92011657 997 $aUNINA