LEADER 02012oam 2200457zu 450 001 9910130718603321 005 20241212220415.0 010 $a9781467303514 010 $a1467303518 035 $a(CKB)3420000000000410 035 $a(SSID)ssj0000702780 035 $a(PQKBManifestationID)12261587 035 $a(PQKBTitleCode)TC0000702780 035 $a(PQKBWorkID)10686661 035 $a(PQKB)10983314 035 $a(NjHacI)993420000000000410 035 $a(EXLCZ)993420000000000410 100 $a20160829d2012 uy 101 0 $aeng 135 $aur||||||||||| 181 $ctxt 182 $cc 183 $acr 200 10$a2012 23rd Annual SEMI Advanced Semiconductor Manufacturing Conference 210 31$a[Place of publication not identified]$cIEEE$d2012 215 $a1 online resource 300 $aBibliographic Level Mode of Issuance: Monograph 311 08$a9781467303507 311 08$a146730350X 327 $aASMC 2012 proceedings produced by: semi [advertisement] -- Organizing Committee -- Corporate sponsors -- Table of contents -- Identifying systematic critical features using silicon diagnosis data -- Using selective voltage binning to maximize yield -- Analytic modeling of AC response to FET-level elements for CLY optimization -- Optimizing product yield using manufacturing defect weights -- Improving yield learning by electrical fault inspection -- Innovative approach to identify location of AMC source in cleanroom by inverse Computational Fluid Dynamics modeling -- Managing variability within wafertest production by combining lean and six sigma. 606 $aProcess control$vCongresses 606 $aSemiconductor industry$xManagement 615 0$aProcess control 615 0$aSemiconductor industry$xManagement. 676 $a658.562 702 $aIEEE Staff 801 0$bPQKB 906 $aPROCEEDING 912 $a9910130718603321 996 $a2012 23rd Annual SEMI Advanced Semiconductor Manufacturing Conference$92508633 997 $aUNINA