LEADER 01439oam 2200469zu 450 001 9910130687503321 005 20241212220410.0 010 $a9781467311373 010 $a1467311375 010 $a9781467311366 010 $a1467311367 035 $a(CKB)3420000000000564 035 $a(SSID)ssj0000781187 035 $a(PQKBManifestationID)12277294 035 $a(PQKBTitleCode)TC0000781187 035 $a(PQKBWorkID)10804244 035 $a(PQKB)10414962 035 $a(NjHacI)993420000000000564 035 $a(EXLCZ)993420000000000564 100 $a20160829d2012 uy 101 0 $aeng 135 $aur||||||||||| 181 $ctxt 182 $cc 183 $acr 200 10$a2012 IEEE International Interconnect Technology Conference 210 31$a[Place of publication not identified]$cIEEE$d2012 215 $a1 online resource 300 $aBibliographic Level Mode of Issuance: Monograph 311 08$a9781467311380 311 08$a1467311383 606 $aMetal oxide semiconductors, Complementary 606 $aInterconnects (Integrated circuit technology) 615 0$aMetal oxide semiconductors, Complementary. 615 0$aInterconnects (Integrated circuit technology) 676 $a621.3815 702 $aIEEE Staff 801 0$bPQKB 906 $aPROCEEDING 912 $a9910130687503321 996 $a2012 IEEE International Interconnect Technology Conference$92533596 997 $aUNINA