LEADER 01123nam0-2200337---450- 001 990009562330403321 005 20120424144504.0 010 $a3-8053-2028-0 035 $a000956233 035 $aFED01000956233 035 $a(Aleph)000956233FED01 035 $a000956233 100 $a20120424d1998----km-y0itay50------ba 101 0 $ager 102 $aDE 105 $af-------001yy 200 1 $aUntersuchungen zur Chronologie und Komposition des Alexandermosaiks auf antiquarischer Grundlage$fvon Michael Pfrommer 210 $aMainz am Rhein$cvon Zabern$d1998 215 $aVIII, 240 p.$c[15] fogli di tav.$d33 cm$e1 carta rip. in tasca 225 1 $aAegyptiaca Treverensia$v8 610 0 $aMosaici pompeiani 610 0 $aAlessandro Magno 676 $a738.52$v22$zita 700 1$aPfrommer,$bMichael$0176667 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990009562330403321 952 $a738.52 PFR 1$bDip.Dis.Stor. 13138$fFLFBC 959 $aFLFBC 996 $aUntersuchungen zur Chronologie und Komposition des Alexandermosaiks auf antiquarischer Grundlage$9847068 997 $aUNINA LEADER 05368nam 2200613 450 001 996426332403316 005 20170816152243.0 010 $a0-85709-875-6 035 $a(CKB)2670000000502107 035 $a(EBL)1666709 035 $a(SSID)ssj0001192507 035 $a(PQKBManifestationID)11704607 035 $a(PQKBTitleCode)TC0001192507 035 $a(PQKBWorkID)11227775 035 $a(PQKB)10908709 035 $a(MiAaPQ)EBC1666709 035 $a(EXLCZ)992670000000502107 100 $a20130816d2014 uy| 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aNanolithography $ethe art of fabricating nanoelectronic and nanophotonic devices and systems /$fedited by Martin Feldman 210 1$aPhiladelphia, PA :$cWoodhead Pub.,$d2014. 215 $a1 online resource (599 p.) 225 1 $aWoodhead Publishing series in electronic and optical materials,$x2050-1501 ;$vnumber 42 300 $aDescription based upon print version of record. 311 $a0-85709-500-5 320 $aIncludes bibliographical references and index. 327 $aCover ; Nanolithography: The art of fabricating nanoelectronic and nanophotonic devices and systems ; Copyright ; Contents; Contributor contact details; Woodhead Publishing Series in Electronic and Optical Materials; Preface; 1: Optical projection lithography; 1.1 Introduction; 1.2 Lithography technology and trends; 1.3 Fundamentals of optical lithography; 1.4 Image evaluation; 1.5 Projection lithography systems; 1.6 Wavelengths for optical lithography; 1.7 Lithography in the deep ultraviolet (UV); 1.8 Resolution enhancement technology; 1.9 Immersion lithography 327 $a1.10 Multiple patterning optical lithography1.11 Conclusion; 1.12 References; 2: Extreme ultraviolet (EUV) lithography; 2.1 Introduction; 2.2 EUV sources; 2.3 EUV optics; 2.4 EUV masks; 2.5 EUV resists; 2.6 EUV integration and implementation challenges; 2.7 Conclusion and future trends; 2.8 Acknowledgments; 2.9 References; 3: Electron beam lithography; 3.1 Introduction; 3.2 Using pixel parallelism to address the throughput bottleneck; 3.3 The tradeoff between resolution and throughput; 3.4 Distributed systems; 3.5 Ultimate lithographic resolution 327 $a3.6 Electron-beam patterning of photomasks for optical lithography3.7 Conclusion; 3.8 Acknowledgements; 3.9 References; 4: Focused ion beams for nano-machining and imaging; 4.1 Introduction; 4.2 An adumbrated history of focused ion beams (FIBs); 4.3 Sources of ions: a quartet of types; 4.4 Charged particle optics; 4.5 Ion-matter interactions; 4.6 Milling; 4.7 Deposition; 4.8 Imaging; 4.9 Spectroscopy; 4.10 Conclusion and future trends; 4.11 References; 5: Masks for microand nanolithography; 5.1 Introduction; 5.2 Mask materials; 5.3 Mask process; 5.4 Mask metrology; 5.5 Defects and masks 327 $a5.6 Conclusion5.7 References; 6: Maskless photolithography; 6.1 Introduction; 6.2 The use of photons as opposed to charged particles; 6.3 Forms of maskless photolithography; 6.4 Zone-plate-array lithography (ZPAL); 6.5 Proximity-effect correction; 6.6 Extending the resolution of ZPAL; 6.7 Commercialization of ZPAL by LumArray, Inc.; 6.8 Conclusion; 6.9 References; 7: Chemistry and processing of resists for nanolithography; 7.1 Introduction; 7.2 Resists for optical lithography: synthesis and radiation induced chemistry of resists as a function of exposure technology 327 $a7.3 Chemically amplified resist process considerations7.4 Chemically amplified resists for 193 nm lithography; 7.5 Resists for extreme ultraviolet lithography (EUVL); 7.6 Resists for electron beam lithography; 7.7 Resists for selected forward looking lithographic technologies; 7.8 Resist resolution limitations; 7.9 Conclusion; 7.10 References; 8: Directed assembly nanolithography; 8.1 Introduction; 8.2 Block copolymers in lithography; 8.3 Directed self-assembly of block copolymers; 8.4 Programmable three-dimensional lithography; 8.5 Conclusion; 8.6 References; 9: Nanoimprint lithography 327 $a9.1 Introduction 330 $aIntegrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing - some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next?? and "How do we get there??Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the re 410 0$aWoodhead Publishing series in electronic and optical materials ;$vno. 42. 606 $aNanolithography 606 $aNanophotonics 606 $aNanotechnology 606 $aNanostructured materials$xDesign and construction 608 $aElectronic books. 615 0$aNanolithography. 615 0$aNanophotonics. 615 0$aNanotechnology. 615 0$aNanostructured materials$xDesign and construction. 676 $a621.381531 701 $aFeldman$b Martin$01010013 801 0$bMiAaPQ 906 $aBOOK 912 $a996426332403316 996 $aNanolithography$92334466 997 $aUNISA LEADER 01875nas 2200565-a 450 001 996204054703316 005 20240413025433.0 035 $a(DE-599)ZDB2030188-1 035 $a(CKB)991042728079416 035 $a(CONSER)---07019288- 035 $a(EXLCZ)99991042728079416 100 $a19940927b19202012 -a- - 101 0 $ager 181 $ctxt$2rdacontent 200 10$aBundesblatt 210 $aBern $cBundeskanzlei$d1920- 215 $a1 online resource 300 $aTitle varies slightly. 300 $aTitle from cover. 300 $aVarious "Beilagen", both serial publications and special reports, are issued with the "Bundesblatt", and in the Library of Congress are usually bound and classified separately.$5DLC 311 08$aPrint version: Bundesblatt. 1420-2476 (DLC) 07019288 (OCoLC)31184810 517 1 $aBundesblatt der Schweizerischen Eidgenossenschaft 517 1 $aBBl 531 $aFEUILLE FéDéRALE 606 $aGazettes$zSwitzerland 606 $aGazettes$2fast$3(OCoLC)fst00939356 606 $alaw reports$2ilot 606 $alegislation$2ilot 606 $arecueil de jurisprudence$2tbit 606 $alégislation$2tbit 606 $arevista de tribunales$2toit 606 $alegislación$2toit 607 $aSwitzerland$2fast$1https://id.oclc.org/worldcat/entity/E39QbtfRmBCgpQrWH3VGcB88Pp 607 $aSwitzerland$2ilot 607 $aSuisse$2tbit 607 $aSuiza$2toit 615 0$aGazettes 615 7$aGazettes. 615 17$alaw reports. 615 17$alegislation. 615 17$arecueil de jurisprudence. 615 17$alégislation. 615 17$arevista de tribunales. 615 17$alegislación. 712 02$aSwitzerland.$bBundeskanzlei. 906 $aJOURNAL 912 $a996204054703316 920 $aexl_impl conversion 996 $aBundesblatt$92293561 997 $aUNISA