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200 1 $a<<10.: >>Merope$etesto definitivo e redazioni inedite$fVittorio Alfieri$ga cura di Angelo Fabrizi
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200 10$aDevelopment of a photoelectrochemical etch process to enable heterogeneous substrate integration of epitaxial III-nitride semiconductors /$fVijay Parameshwaran [and six others]
210  1$aAdelphi, MD :$cUS Army Research Laboratory,$dDecember 2017.
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