LEADER 00843nam0-22003011i-450- 001 990000498540403321 005 20080303093731.0 035 $a000049854 035 $aFED01000049854 035 $a(Aleph)000049854FED01 035 $a000049854 100 $a20020821d1932----km-y0itay50------ba 101 0 $aeng 105 $aa-------001yy 200 1 $aPhotoelectric phenomena$fArthur Llewelyn Hughes, Lee Alvin Dubridge 210 $aNew York ; London$cMcGraw-Hill$d1932 215 $a531 p.$cill.$d24 cm 225 1 $aInternational series in physics 610 0 $aFotoelettricitą 676 $a537.54 700 1$aHughes,$bArthur Llewelyn 701 1$aDubridge,$bLee Alvin 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990000498540403321 952 $a10 C I 36$b2855$fDINEL 959 $aDINEL 997 $aUNINA LEADER 04730nam 22007095 450 001 9910254156003321 005 20200704033413.0 010 $a981-10-4334-5 024 7 $a10.1007/978-981-10-4334-5 035 $a(CKB)3710000001394103 035 $a(DE-He213)978-981-10-4334-5 035 $a(MiAaPQ)EBC4871089 035 $a(PPN)202989186 035 $a(EXLCZ)993710000001394103 100 $a20170602d2017 u| 0 101 0 $aeng 135 $aurnn|008mamaa 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aImpact of Ion Implantation on Quantum Dot Heterostructures and Devices /$fby Arjun Mandal, Subhananda Chakrabarti 205 $a1st ed. 2017. 210 1$aSingapore :$cSpringer Singapore :$cImprint: Springer,$d2017. 215 $a1 online resource (XXIII, 64 p. 53 illus., 32 illus. in color.) 311 $a981-10-4333-7 320 $aIncludes bibliographical references at the end of each chapters. 327 $aPreface -- Acknowledgement -- Contents -- List of Figures -- List of Tables -- Abbreviations -- Chapter 1: Introduction to Quantum Dots -- Chapter 2: Low energy ion implantation over single layer InAs/GaAs quantum dots -- Chapter 3: Optimizations for quaternary alloy (InAlGaAs) capped InAs/GaAs multilayer quantum dots -- Chapter 4: Effects of low energy light ion (H?) implantations on quaternary-alloy-capped InAs/GaAs quantum dot infrared photodetectors -- Chapter 5: Effects of low energy light ion (H?) implantation on quaternary-alloy-capped InGaAs/GaAs quantum dot infrared photodetectors. 330 $aThis book looks at the effects of ion implantation as an effective post-growth technique to improve the material properties, and ultimately, the device performance of In(Ga)As/GaAs quantum dot (QD) heterostructures. Over the past two decades, In(Ga)As/GaAs-based QD heterostructures have marked their superiority, particularly for application in lasers and photodetectors. Several in-situ and ex-situ techniques that improve material quality and device performance have already been reported. These techniques are necessary to maintain dot density and dot size uniformity in QD heterostructures and also to improve the material quality of heterostructures by removing defects from the system. While rapid thermal annealing, pulsed laser annealing and the hydrogen passivation technique have been popular as post-growth methods, ion implantation had not been explored largely as a post-growth method for improving the material properties of In(Ga)As/GaAs QD heterostructures. This work attempts to remedy this gap in the literature. The work also looks at introduction of a capping layer of quaternary alloy InAlGaAs over these In(Ga)As/GaAs QDs to achieve better QD characteristics. The contents of this volume will prove useful to researchers and professionals involved in the study of QDs and QD-based devices. 606 $aOptical materials 606 $aElectronics$xMaterials 606 $aElectronic circuits 606 $aLasers 606 $aPhotonics 606 $aSignal processing 606 $aImage processing 606 $aSpeech processing systems 606 $aOptical and Electronic Materials$3https://scigraph.springernature.com/ontologies/product-market-codes/Z12000 606 $aCircuits and Systems$3https://scigraph.springernature.com/ontologies/product-market-codes/T24068 606 $aElectronic Circuits and Devices$3https://scigraph.springernature.com/ontologies/product-market-codes/P31010 606 $aOptics, Lasers, Photonics, Optical Devices$3https://scigraph.springernature.com/ontologies/product-market-codes/P31030 606 $aSignal, Image and Speech Processing$3https://scigraph.springernature.com/ontologies/product-market-codes/T24051 615 0$aOptical materials. 615 0$aElectronics$xMaterials. 615 0$aElectronic circuits. 615 0$aLasers. 615 0$aPhotonics. 615 0$aSignal processing. 615 0$aImage processing. 615 0$aSpeech processing systems. 615 14$aOptical and Electronic Materials. 615 24$aCircuits and Systems. 615 24$aElectronic Circuits and Devices. 615 24$aOptics, Lasers, Photonics, Optical Devices. 615 24$aSignal, Image and Speech Processing. 676 $a620.11295 676 $a620.11297 700 $aMandal$b Arjun$4aut$4http://id.loc.gov/vocabulary/relators/aut$0767412 702 $aChakrabarti$b Subhananda$4aut$4http://id.loc.gov/vocabulary/relators/aut 906 $aBOOK 912 $a9910254156003321 996 $aImpact of Ion Implantation on Quantum Dot Heterostructures and Devices$92036113 997 $aUNINA