LEADER 00906nam0 22002651i 450 
001 RML0283694
005 20231121125731.0
010   $a047107828X
100   $a20121121d1980    ||||0itac50      ba
101 | $aeng
102   $aus
181  1$6z01$ai $bxxxe  
182  1$6z01$an
200 1 $aGlow Discharge Processes$esputtering and plasma etching$fBrian Chapman
210   $aNew York $cWiley $d1980
215   $axvi, 406 p.$d23 cm.
700  1$aChapman$b, Brian$3RMLV182969$0236695
801  3$aIT$bIT-01$c20121121
850   $aIT-FR0099          
899   $aBiblioteca Area Ingegneristica$bFR0099          
912   $aRML0283694
950  0$aBiblioteca Area Ingegneristica$d 54DII       537.5 CHA$e 54VM 0000534555  VM                        barcode:BAIN004843. - Inventario:4621DVM$fA $h20050224$i20121204
977   $a 54
996   $aGlow Discharge Processes$93627020
997   $aUNICAS