LEADER 02237nam0 22005653i 450 001 VAN00285805 005 20250401091022.543 017 70$2N$a9789819911417 100 $a20250129d2023 |0itac50 ba 101 $aeng 102 $aSG 105 $a|||| ||||| 181 $ai$b e 182 $ab 183 $acr 200 1 $aPulsed Discharge Plasmas$eCharacteristics and Applications$fTao Shao, Cheng Zhang editors 210 $aSingapore$cSpringer$d2023 215 $axii, 1034 p.$cill.$d24 cm 410 1$1001VAN00191301$12001 $aSpringer Series in Plasma Science and Technology$1210 $aCham [etc.]$cSpringer 606 $a70-XX$xMechanics of particles and systems [MSC 2020]$3VANC021390$2MF 606 $a76Xxx$xIonized gas flow in electromagnetic fields; plasmic flow [MSC 2020]$3VANC023330$2MF 606 $a92Exx$xChemistry [MSC 2020]$3VANC025596$2MF 610 $aChemical reactions$9KW:K 610 $aDielectric Barrier Discharge$9KW:K 610 $aDiffuse discharge$9KW:K 610 $aElectrical explosion$9KW:K 610 $aEnergy Conversion$9KW:K 610 $aFlow control$9KW:K 610 $aFluid model$9KW:K 610 $aGas discharge$9KW:K 610 $aHigh voltage$9KW:K 610 $aNumerical simulation$9KW:K 610 $aOptical Diagnostics$9KW:K 610 $aPlasma biomedicine$9KW:K 610 $aPlasma deposition$9KW:K 610 $aPlasma jet$9KW:K 610 $aPulse switch$9KW:K 610 $aSurface Modification$9KW:K 620 $aSG$dSingapore$3VANL000061 702 1$aShao$bTao$3VANV239766$4340 702 1$aZhang$bCheng$3VANV239767$4340 712 $aSpringer $3VANV108073$4650 801 $aIT$bSOL$c20250905$gRICA 856 4 $uhttps://doi.org/10.1007/978-981-99-1141-7$zE-book ? Accesso al full-text attraverso riconoscimento IP di Ateneo, proxy e/o Shibboleth 899 $aBIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICA$1IT-CE0120$2VAN08 912 $fN 912 $aVAN00285805 950 $aBIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICA$d08DLOAD e-Book 10472 $e08eMF10472 20250212 996 $aPulsed Discharge Plasmas$94310587 997 $aUNICAMPANIA