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001 VAN00258134
005 20240806101453.156
017 70$2N$a9781461480549
100   $a20230510d2014       |0itac50      ba
101   $aeng
102   $aUS
105   $a||||    |||||
200 1 $aAtomic Layer Deposition for Semiconductors$feditor Choel Seong Hwang
210   $aNew York$cSpringer$d2014
215   $aX, 263 p.$cill.$d24 cm
620   $aUS$dNew York$3VANL000011
702  1$aHwang$bChoel S.$3VANV212008
712   $aSpringer <editore>$3VANV108073$4650
801   $aIT$bSOL$c20240906$gRICA
856 4 $uhttps://link.springer.com/book/10.1007/978-1-4614-8054-9$zE-book - Accesso al full-text attraverso riconoscimento IP di Ateneo, proxy e/o Shibboleth
899   $aBIBLIOTECA DEL DIPARTIMENTO DI SCIENZE E TECNOLOGIE AMBIENTALI BIOLOGICHE E FARMACEUTICHE$1IT-CE0101$2VAN17
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950   $aBIBLIOTECA DEL DIPARTIMENTO DI SCIENZE E TECNOLOGIE AMBIENTALI BIOLOGICHE E FARMACEUTICHE$d17CONS      e-book                  2305        $e17BIB2305/95   95      20230510            $sBuono
996   $aAtomic Layer Deposition for Semiconductors$92495567
997   $aUNICAMPANIA