LEADER 01599nam0 2200349 i 450 001 SUN0113852 005 20180126100822.112 010 $d0.00 017 70$2N$a978-3-319-24469-3 100 $a20180122d2015 |0engc50 ba 101 $aeng 102 $aCH 105 $a|||| ||||| 200 1 $aA *concise introduction to analysis$fDaniel W. Stroock 205 $a[Cham] : Springer, 2015 210 $aXII$d218 p. ; 24 cm 215 $aPubblicazione in formato elettronico 606 $a26-XX$xReal functions [MSC 2020]$2MF$3SUNC019778 606 $a26B15$xIntegration of real functions of several variables: length, area, volume [MSC 2020]$2MF$3SUNC021498 606 $a26A06$xOne-variable calculus [MSC 2020]$2MF$3SUNC022162 606 $a26A24$xDifferentiation (real functions of one variable): general theory, generalized derivatives, mean-value theorems [MSC 2020]$2MF$3SUNC024616 606 $a26B05$xContinuity and differentiation questions [MSC 2020]$2MF$3SUNC024647 606 $a30Axx$xGeneral properties of functions of one complex variable [MSC 2020]$2MF$3SUNC028784 620 $aCH$dCham$3SUNL001889 700 1$aStroock$b, Daniel W.$3SUNV039940$042628 712 $aSpringer$3SUNV000178$4650 801 $aIT$bSOL$c20210503$gRICA 856 4 $uhttp://dx.doi.org/10.1007/978-3-319-24469-3 912 $aSUN0113852 950 $aUFFICIO DI BIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICA$d08CONS e-book 0046 $e08eMF46 20180122 996 $aConcise introduction to analysis$91522812 997 $aUNICAMPANIA LEADER 05391nam 2200709Ia 450 001 9910457850803321 005 20200520144314.0 010 $a1-280-59350-4 010 $a9786613623331 010 $a0-19-992099-0 035 $a(CKB)2550000000089311 035 $a(EBL)886626 035 $a(OCoLC)777268040 035 $a(SSID)ssj0000638917 035 $a(PQKBManifestationID)11408673 035 $a(PQKBTitleCode)TC0000638917 035 $a(PQKBWorkID)10598661 035 $a(PQKB)11077483 035 $a(MiAaPQ)EBC886626 035 $a(Au-PeEL)EBL886626 035 $a(CaPaEBR)ebr10532647 035 $a(CaONFJC)MIL362333 035 $a(EXLCZ)992550000000089311 100 $a20110808d2011 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aNanofabrication using focused ion and electron beams$b[electronic resource] $eprinciples and applications /$fedited by Ivo Utke, Stanislav Moshkalev, Phillip Russell 210 $aOxford ;$aNew York $cOxford University Press$d2011 215 $a1 online resource (830 p.) 225 0 $aNanomanufacturing series ;$vv. 1 300 $aDescription based upon print version of record. 311 $a0-19-973421-6 327 $aCover; Contents; Foreword; Preface; Contributors; INTRODUCTION; I-1.The Historical Development of Electron Beam Induced Deposition and Etching: From Carbonaceous to Functional Materials; I-2. Historical Evolution of FIB Instrumentation and Technology: From Circuit Editing to Nanoprototyping; PART I: FUNDAMENTALS AND MODELS; 1.The Theory of Bright Field Electron and Field Ion Emission Sources; 2. How to Select Compounds for Focused Charged Particle Beam Assisted Etching and Deposition; 3. Gas Injection Systems for FEB and FIB Processing Theory and Experiment 327 $a4. Fundamentals of Interactions of Electrons with Molecules5. Simulation of Focused Ion Beam Milling; 6. FEB and FIB Continuum Models for One Adsorbate Species; 7. Continuum Modeling of Electron Beam Induced Processes; 8. Monte Carlo Method in FEBID Process Simulations; PART II: APPLICATIONS; 9. Focused Electron Beam Induced Processing (FEBIP) for Industrial Applications; 10. Focused Ion Beam and DualBeamTMTechnology Applied to Nanoprototyping; 11. Review of FIB Tomography; 12. In situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing 327 $a13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles14. Electron- and Ion-Assisted Metal Deposition for the Fabrication of Nanodevices Based on Individual Nanowires; 15. Focused Ion Beam Fabrication of Carbon Nanotube and ZnO Nanodevices; 16. Focused Ion and Electron Beam Induced Deposition of Magnetic Nanostructures; 17. Metal Films and Nanowires Deposited by FIB and FEB for Nanofabrication and Nanocontacting; 18. FIB Etching for Photonic Device Applications; 19. FIB etching of InP for Rapid Prototyping of Photonic Crystals 327 $a20. Applications of FIB for Rapid Prototyping of Photonic Devices, Fabrication of Nanosieves, Nanowires, and Nanoantennas21. Focused Particle Beam Induced Deposition of Silicon Dioxide; 22. Growth and Characterization of FEB-Deposited Suspended Nanostructures; 23. Electrical Transport Properties of Metallic Nanowires and Nanoconstrictions Created with FIB; 24. Structure-Property Relationship of Electronic Transport in FEBID Structures; 25. Characterization and Modification of Nanostructured Carbon Materials Using FIB and FEB 327 $a26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes27. Nanofabrication Using Electron Beam Lithography Processes; PART III: PROSPECTIVES; F-1. Focused Beam Processing-New BeamTechnologies-New Challenges in Process Development and Nanofabrication; Index; A; B; C; D; E; F; G; H; I; J; K; L; M; N; O; P; Q; R; S; T; U; V; W; X; Y; Z 330 $aNanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabr 410 0$aOxford Series in Nanomanufacturing 606 $aNanostructured materials 606 $aNanotechnology 606 $aElectron beams$xIndustrial applications 606 $aIon bombardment$xIndustrial applications 608 $aElectronic books. 615 0$aNanostructured materials. 615 0$aNanotechnology. 615 0$aElectron beams$xIndustrial applications. 615 0$aIon bombardment$xIndustrial applications. 676 $a620.1/15 701 $aUtke$b Ivo$0934858 701 $aMoshkalev$b Stanislav$0934859 701 $aRussell$b Phillip$f1955-$0934860 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910457850803321 996 $aNanofabrication using focused ion and electron beams$92105269 997 $aUNINA