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200 00$aEffect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane (Dow-Corning 704) precursor on the properties of silicon containing diamond-like carbon (Si-DLC) coatings synthesized by ion-beam-assisted deposition (IBAD)$b[electronic resource] /$fby C. G. Fountzoulas ... [and others]
210  1$aAberdeen Proving Ground, MD :$cArmy Research Laboratory,$d[1999]
215   $aviii, 14 pages $cdigital, PDF file
225 1 $aARL-TR ;$v1942
300   $aTitle from title screen (viewed Feb. 26, 2009).
300   $a"May 1999."
320   $aIncludes bibliographical references (page 9).
517   $aEffect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane 
606   $aSurfaces (Technology)
606   $aSilicon
606   $aIon implantation
606   $aChemical bonds
615  0$aSurfaces (Technology)
615  0$aSilicon.
615  0$aIon implantation.
615  0$aChemical bonds.
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