02436nam a2200325Ii 4500991003233199707536070806s2006 ne a fsb 001 0 eng d9780080446998008044699Xb13652692-39ule_instBibl. Dip.le Aggr. Ingegneria Innovazione - Sez. Ingegneria Innovazioneeng621.3815222SreeHarsha, K. S.627405Principles of physical vapor deposition of thin films[e-book] /K.S. Sree HarshaAmsterdam ;Boston ;London :Elsevier,2006xi, 1160 p. :ill. ;25 cmIncludes bibliographical references and indexThe goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the textElectronic reproduction.Amsterdam :Elsevier Science & Technology,2007.Mode of access: World Wide Web.System requirements: Web browser.Title from title screen (viewed on Aug. 2, 2007).Access may be restricted to users at subscribing institutionsThin filmsVapor-platingElectronic books.localOriginal008044699X9780080446998(DLC) 2005937842(OCoLC)61217411Referexhttp://www.sciencedirect.com/science/book/9780080446998An electronic book accessible through the World Wide Web; click for informationPublisher descriptionhttp://catdir.loc.gov/catdir/enhancements/fy0664/2005937842-d.html.b1365269203-03-2224-01-08991003233199707536Principles of physical vapor deposition of thin films1212864UNISALENTOle02624-01-08m@ -engne 00