01249nam a2200337 i 450099100307157970753620021122115200.0020320s1999 uk ||| | eng 0471973866392900b11750571-39ule_instLE00646097ExLDip.to Fisicaita53.6.5660.044TA2020Bouchoule, André530310Dusty plasmas :physics, chemistry, and technological impacts in plasma processing /edited by André BouchouleChichester, England ; New York :John Wiley & Sons,c1999viii, 408 p. :ill. ;24 cm.Includes bibliographical references and indexes.Dusty plasmasPlasma chemistryPlasma engineeringPlasma enhanced chemical vapor depositionPlasma (Ionized gases)-Industrial applications.b1175057102-04-1422-11-02991003071579707536LE006 53.6.5 BOU12006000085533le006-E0.00-l- 00000.i1199315722-11-02Dusty plasmas905597UNISALENTOle00601-01-02ma -enguk 01